1.
Study of Low Temperature Plasma Enhanced Chemical Vapor Deposition and the Preparation of Si_3N_4 Thin Film;
低温等离子体增强CVD技术及制备氮化硅薄膜的研究
2.
The Fabrication of Continuous High Performance SiC Fiber by Chemical Vapor Deposition;
CVD法制备高性能SiC连续纤维技术
3.
Study on Tribochemical Polishing Technique of CVD Diamond Film;
CVD金刚石膜摩擦化学抛光技术研究
4.
The Bonding Technique of CVD Diamond Thick Film and Welding Tool;
CVD金刚石厚膜及焊接刀具的连接技术
5.
Development of Preparative Technique and Application of Chemical Vapor Deposition Diamond(Film)
CVD金刚石膜制备技术及应用进展
6.
The application of reactive power compensator to DC-Arc plasma CVD diamond equipment
无功功率补偿技术在直流电弧CVD金刚石设备中的应用
7.
The Preparation of Cubic Boron Nitride Thin Films by ECR CVD System and Study of Their Properties;
ECR CVD制备立方氮化硼薄膜及性能研究
8.
Computer Control System of Producing Carbon Nanotubes with CVD;
CVD法制备纳米碳管的计算机控制系统
9.
The Study of A-Si-H Films Prepared by MWECR CVD;
MWECR CVD制备a-Si:H薄膜光稳定性研究
10.
Simulation of Growth Process of Titania Nanoparticles Synthesized by Flame CVD Process;
火焰CVD法制备TiO_2纳米颗粒的数值模拟
11.
Reserches of Equipment Design and Process Mechanics about CVD(CVI) Silica;
CVD/CVI氧化硅设备研制及工艺机理探索
12.
Oxidation Behaviors and Mechanisms of Boron-Containing CVD SiC Complex Coating;
含硼CVD SiC复合涂层的氧化行为与机理
13.
The Preparation of Device-Quality Hydrogenated Amorphous Silicon Thin Films by Mwecr-Cvd Assisted by Hot-Wire;
热丝辅助MWECR-CVD制备器件级非晶硅薄膜
14.
Deposition Process Study of Device Quality a-Si:H Film by Method of MWECR CVD with High Deposition Rate;
MWECR CVD高速制备a-Si：H薄膜的工艺研究
15.
The Study of the Coating of Silicon Dioxide by CVD Utilizing TEOS-O_3;
CVD法采用TEOS-O_3沉积二氧化硅膜
16.
Synthesis and Characterization of Aligned Carbon Nanotubes Prepared by CVD;
CVD法制备定向纳米碳管及其表征
17.
Study on Growth and Optical Emission of a-SiN_x: H Films Prepared by ECR-CVD;
ECR-CVD制备a-SixN：H薄膜及其发光性能的研究
18.
Control System Development of Vacuum Induction CVI/CVD Processes;
真空感应CVI/CVD过程控制系统开发