1.
brilliant cutting
(玻璃)磨光刻花法
2.
raster scan electron beam lithography
光栅扫描电子束光刻
3.
Over 8 years experience in Implant /Diffusion/ Etch/ Photo process.
8年注入/扩散/刻蚀/光刻经验。
4.
vector scan electron beam lithography
矢量扫描电子束光刻
5.
electron chrome mask
电子束光刻用铬掩模
6.
photoresist controlled etch
光刻胶掩蔽控制腐蚀
7.
direct write electron beam system
直写式电子束光刻装置
8.
fine featured resist
精细结构光刻用抗蚀剂
9.
scaled down lithography
按比例缩小光刻技术
10.
Research of SU-8 Resist Lithography Using Ultraviolet Laser;
紫外激光曝光光刻SU-8胶的工艺研究
11.
Phase Shift Mask Monitor Scanner Focus;
利用相移光刻掩膜版监测光刻机台焦距
12.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
13.
The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;
化学增幅光刻胶及其在电子束光刻中的应用
14.
Study on Synthesis of Photoresist and Photochemical Process for Information Recording in Laser Disc
激光光盘信息记录光刻胶的合成与感光
15.
raster scan electron beam system
光栅扫描电子束光刻系统
16.
Research of Focus Optical System Used in Ultraviolet Photolithography;
用于紫外光刻的聚焦光学系统的研究
17.
Study on Key Technologies in UV-LED Fiber Lithography System
紫外LED光纤光刻系统关键技术研究
18.
Alignment System with Multi-Grating Mark for Lithographic Apparatus
用于光刻装置的多光栅标记对准系统