1.
A CNC Chemical Etching Technology of Optics Suface Based on the Marangoni Effect;
基于Marangoni效应的数控化学抛光工艺研究
2.
Study on Computer Controlled Polishing of the Large Size Plane Optical Components;
大口径平面光学元件的数控抛光技术研究
3.
Studies on Computer Controlled Optical Finishing for Large Aperture High Precision Optics;
大口径高精度光学元件数控抛光技术研究
4.
chemically polished chip
化学抛光管芯, 化学抛光微晶粒
5.
Study on Conditioner for Polishing Pad in CMP;
化学机械抛光用抛光垫修整器的研究
6.
Study on Electrochemical Mechanism and Polishing Rate of Chemical-Mechanical Polishing of Copper;
铜化学-机械抛光电化学机理与抛光速率的研究
7.
Finite Element Analysis of Polishing System and Optimization of Polishing Process Parameter;
抛光系统有限元分析及抛光工艺参数优化
8.
The Optimal Design and Technics Study on the Removing Function of Polishing of a Small Tool in Computer Control;
计算机控制小工具抛光去除函数的优化设计及工艺研究
9.
Study on Conditioning Technology of Polishing Pad in CMP;
化学机械抛光中抛光垫修整技术的研究
10.
Chemical mechanical polishing for silicon wafer by composite abrasive slurry
利用复合磨粒抛光液的硅片化学机械抛光
11.
Development and Research of CNC System for Machine Tool with Bonnet Tool
气囊式抛光机数控系统的研究与开发
12.
Computer controlled polishing for middle or small double-sided aspheric lens
中小口径双非球面数控抛光技术研究
13.
The Study of Spiral Surface Belt Polishing Process Method and Special CNC Polishing Machine
螺旋曲面砂带抛光工艺方法及专用数控抛光机研究
14.
Average Number of Optical Phonons of Strong-coupling Bound Polaron in a Parabolic Quantum Dot
抛物量子点中强耦合束缚极化子的光学声子平均数
15.
Study on the Technologic Parameter and Wear Model of Retaining Ring in Chemical Mechanical Polishing Process;
化学机械抛光保持环工艺参数及磨损模型的研究
16.
Study on the Selection of Technological Parameter in Power-mixed Pulse Electrochemical Polishing Based on Neural Network
基于神经网络的混粉脉冲电化学抛光工艺参数选择研究
17.
Study on Electrochemistry and Polishing Rate of Chemical Mechanical Polishing of Semiconductor Silicon Wafer;
半导体硅片化学机械抛光电化学与抛光速率研究
18.
Influence of abrasive and chemical composition on chemo-mechanical polishing of MgO single crystal substrate
抛光液中磨料和化学成分对单晶MgO基片化学机械抛光的影响