1.
Preparation and Property of High-k HfO_2 Gate Dielectric Materials
高介电常数HfO_2栅介质的制备及性能
2.
Study on Surface and Interfacial Characteristics of HfO_2 High-k Gate Dielectric
HfO_2栅介质的表面界面特性研究
3.
Interfacial and Electrical Characterization of HfO_2 Gate Dielectric Film with a Blocking Layer of Al_2O_3
具有Al_2O_3阻挡层的HfO_2栅介质膜的界面和电学性能的表征(英文)
4.
Physical and electrical properties of the high-κ dielectrics with Ni and Al inclusion in HfO_2
高介电栅介质材料HfO_2掺杂后的物理电学特性(英文)
5.
Influence of Ta and TaN bottom electrodes on electrical performances of MIM capacitors with atomic-layer-deposited HfO_2 dielectric
Ta和TaN底电极对原子层淀积HfO_2介质MIM电性能的影响
6.
Analysis of Performance of 0.25 μm Dielectric Defined Gate and Normal Process Gate PHEMTs
0.25μm介质栅与非介质栅PHEMT的性能比较分析
7.
Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film
高介电栅介质ZrO_2薄膜的物理电学性能
8.
Gate Leakage Properties of Small-Scaled High-k Gate Dielectric MOS Devices;
小尺寸高k栅介质MOS器件栅极漏电特性研究
9.
Study on the Characteristic of Appearance of Multilayer Dielectric Grating Mask;
多层介质膜光栅掩膜形貌特性的研究
10.
Electrical Properties of High-k Gate Dielectric SiGe MOS Devices;
高k栅介质SiGe MOS器件电特性研究
11.
Influences of Different Interlayers on Properties of MOS with HfTaON Gate Dielectric
不同界面层对HfTaON栅介质MOS特性的影响
12.
Study on Electrical Characteristics of Ge-pMOSFET with Ultrathin High-k Gate Dielectrics
超薄高k栅介质Ge-pMOSFET的电特性研究
13.
AlGaN/GaN MIS-HEMT with Magnetron Sputtered AlN
磁控溅射AlN介质MIS栅结构的AlGaN/GaN HEMT
14.
Study on Preparation and Properties of SiC/Si Heterostructures and Hafnium Oxide High-κ Thin Films;
SiC/Si异质结构和HfO_2高κ薄膜制备及其性能研究
15.
Thermal stability and electrical properties of high-k LaErO_3 films
作为高介电常数栅介质材料的LaErO_3薄膜热稳定性和电学性质的研究
16.
Model and Technology of High-k Gate Dielectric MOS Devices;
高k栅介质MOS器件模型和制备工艺研究
17.
Profile Control and Detection of Multi-layer Dielectric Grating Masks;
多层介质膜光栅掩模槽形的控制与检测
18.
Research on the Characteristics of the Guided-mode Resonances in Dielectric Subwavelength Gratings;
亚波长介质光栅的导模共振效应特性研究