1.
Research on the Characteristics of the Guided-mode Resonances in Dielectric Subwavelength Gratings;
亚波长介质光栅的导模共振效应特性研究
2.
Study on the Characteristic of Appearance of Multilayer Dielectric Grating Mask;
多层介质膜光栅掩膜形貌特性的研究
3.
Profile Control and Detection of Multi-layer Dielectric Grating Masks;
多层介质膜光栅掩模槽形的控制与检测
4.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
5.
Analysis of Performance of 0.25 μm Dielectric Defined Gate and Normal Process Gate PHEMTs
0.25μm介质栅与非介质栅PHEMT的性能比较分析
6.
Rigorous Coupled-wave Analysis for the High Reflective Mirror Used in Multi-layer Dielectric Grating
多层介质膜光栅用高反射镜的严格耦合波分析(英文)
7.
Effect of Electric Filed Enhancement on Laser-induced Damage Morphology of Multi-layer Dielectric Grating
电场的增强作用对介质膜光栅损伤形貌的影响(英文)
8.
Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film
高介电栅介质ZrO_2薄膜的物理电学性能
9.
Preparation and Property of High-k HfO_2 Gate Dielectric Materials
高介电常数HfO_2栅介质的制备及性能
10.
Gate Leakage Properties of Small-Scaled High-k Gate Dielectric MOS Devices;
小尺寸高k栅介质MOS器件栅极漏电特性研究
11.
Electrical Properties of High-k Gate Dielectric SiGe MOS Devices;
高k栅介质SiGe MOS器件电特性研究
12.
Study on Surface and Interfacial Characteristics of HfO_2 High-k Gate Dielectric
HfO_2栅介质的表面界面特性研究
13.
Influences of Different Interlayers on Properties of MOS with HfTaON Gate Dielectric
不同界面层对HfTaON栅介质MOS特性的影响
14.
Study on Electrical Characteristics of Ge-pMOSFET with Ultrathin High-k Gate Dielectrics
超薄高k栅介质Ge-pMOSFET的电特性研究
15.
AlGaN/GaN MIS-HEMT with Magnetron Sputtered AlN
磁控溅射AlN介质MIS栅结构的AlGaN/GaN HEMT
16.
Thermal stability and electrical properties of high-k LaErO_3 films
作为高介电常数栅介质材料的LaErO_3薄膜热稳定性和电学性质的研究
17.
Model and Technology of High-k Gate Dielectric MOS Devices;
高k栅介质MOS器件模型和制备工艺研究
18.
Studies on the High-K Gate Dielectrics MOSFET and Related Device Effects;
高K介质栅纳米MOSFET特性及相关器件效应的研究