1.
Tolerance of ion beam etching on multilayer dielectric thin film reflector for spectrum reshaping
多层介质膜光谱调制反射镜的反应离子束刻蚀误差容限
2.
APPLICATION OF ION BEAM MILLING TECHNIQUE TO JOSEPHSON DEVICE TECHNOLOGY
离子束刻蚀技术在约瑟夫逊器件工艺中的应用
3.
Acceptable Error of Etching Depth in Ion Beam Etching Microlens
离子束蚀刻微透镜中蚀刻深度允许误差的研究
4.
Generic specification of ion beam etching system
GB/T15861-1995离子束蚀刻机通用技术条件
5.
The Mechanism Analysis of HgCdTe pn Junction Formed by Ion Beam Milling
离子束刻蚀HgCdTe成结机制分析
6.
An Investigation of Reactive Ion Etching for Through Silicon Via Packaging Technology
反应离子刻蚀在穿透硅通孔封装技术中的应用研究
7.
Inductively coupled plasma reactive ion etching of InSb photovoltaic detector arrays
InSb阵列探测芯片的感应耦合等离子反应刻蚀研究
8.
study on step sidewall tilt in ion beam etching of Fresnel lens
离子束刻蚀过程中台阶侧壁倾斜现象研究
9.
Fabrication of 128×128 Area Silicon Field Emission Arrays Using Ar Ion Beam Etching
128×128元硅场发射阵列的氩离子束刻蚀制作
10.
Study ofⅠ-Ⅴand R_D-V Characteristics of Ion Beam Milling HgCdTe Loophole pn Junction (PartⅡ)
离子束刻蚀HgCdTe环孔pn结Ⅰ—Ⅴ、R_D—V特性的研究(下)
11.
Study ofⅠ-Ⅴand R_D-V Characteristics of Ion Beam Milling HgCdTe Loophole pn Junction
离子束刻蚀HgCdTe环孔pn结Ⅰ-Ⅴ、R_D-V特性的研究(上)
12.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
13.
Investigation of Planar and Channel Optical Waveguides Fabricated by Ion Implantation and Ion Beam Etching;
离子注入与离子束刻蚀制备平面和条形光波导的研究
14.
plasma sputter combined etching
等离子溅射复合刻蚀
15.
RIE of SiO_2 Nanoparticles and Its Application in Preparation of Silicon Nanopillar Array
二氧化硅纳米颗粒的反应离子刻蚀及其在硅纳米针尖制备中的应用(英文)
16.
Gas-Assisted Etching of Micro-Hole Lattice Array on Lithium Niobate with Focused Ion Beam
用聚焦离子束气体辅助刻蚀在LiNbO_3上制备亚微米圆孔点阵
17.
Investigation of Inductively Coupled Fluorocarbon Plasma and Etching of SiO_2;
碳氟感应耦合等离子体及其SiO_2介质刻蚀研究
18.
The Study of the Etching Process with RF Cold Plasma at Atmospheric-pressure;
常压射频冷等离子体在刻蚀工艺中的应用研究