1.
Experimental Research on Photomask Repair System Using Laser Induced Chemical Vapor Deposition(LCVD) Method;
激光化学气相沉积光掩模版修复系统的研究
2.
The Experiment of Applying Autopaint Technique to Repairing Clear Defect on Photomask
应用自动喷涂技术修复掩模版透明缺陷实验
3.
Lithography, as used in the manufacture of ICs, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer.
光刻技术应用到集成电路制造中，就是将掩模版的几何图形转移到硅片表面的工艺过程。
4.
Study of Competition Strategy for Toppan Photomask Company LTD, Shanghai;
上海凸版光掩模有限公司竞争战略研究
5.
Silicon Nitride Thin Film Deposited by PECVD as a Protecting Layer on Photolithography Mask
PECVD淀积Si_3N_4作为光刻掩膜版的保护膜
6.
mask programmable integration
掩模可编程序集成电路
7.
Hard surface photomask substrates
GB/T15871-1995硬面光掩模基板
8.
electron beam generated mask
电子束技术制造的掩模
9.
hard-surface in-contact mask
表面坚固内接触掩模
10.
electron beam mask generator
电子束掩模图象发生器
11.
mask program read-only memory
掩模程序只读存储器
12.
photoresist mask pattern
光致抗蚀剂掩模图形
13.
electron beam mask system
电子束掩模制造系统
14.
mask programmable memory
掩模可编程序存储器
15.
trench mask definition
槽腐蚀用掩模图象形成
16.
electron chrome mask
电子束光刻用铬掩模
17.
masking clean / etch statio
掩模板清洗[腐蚀]台
18.
fixed-mask type ROM
固定掩模型只读存储器