1.
masking clean / etch statio
掩模板清洗[腐蚀]台
2.
PRINCIPLE AND DESIGN OF PHASEMASK USED AS INSCRIBING STEP CHIRPED FIBER GRATING
用于步进啁啾光纤光栅的掩模板原理和设计
3.
Optical Fiber Bragg Grating Sensor by Phase Mask Method
采用掩模板制作的光纤布喇格光栅传感器
4.
The Study on 1-3MHz Dual-Frequency Laser Using Anisotropic Bireflectance Film and Nano-Postioning System for Measurements of Microelectronic Mask;
中频差双反射膜激光及掩模板测量纳米定位系统研究
5.
The Study on Heterodyne Interferometric Microscope for Profiles of Microelectronic Mask Surfaces Measurement;
用于掩模板表面形貌测量的外差干涉显微系统的研究
6.
Hard surface photomask substrates
GB/T15871-1995硬面光掩模基板
7.
Specification for round quartz photomask substrates
GB/T16523-1996圆形石英玻璃光掩模基板规范
8.
mask programmable integration
掩模可编程序集成电路
9.
electron beam generated mask
电子束技术制造的掩模
10.
hard-surface in-contact mask
表面坚固内接触掩模
11.
electron beam mask generator
电子束掩模图象发生器
12.
mask program read-only memory
掩模程序只读存储器
13.
photoresist mask pattern
光致抗蚀剂掩模图形
14.
electron beam mask system
电子束掩模制造系统
15.
mask programmable memory
掩模可编程序存储器
16.
trench mask definition
槽腐蚀用掩模图象形成
17.
electron chrome mask
电子束光刻用铬掩模
18.
fixed-mask type ROM
固定掩模型只读存储器