1.
1064 nm Laser Conditioning Effect of HfO_2/SiO_2 High Reflectors Deposited by E-Beam
电子束蒸发制备HfO_2/SiO_2高反膜的1064 nm激光预处理效应
2.
Study on Surface and Interfacial Characteristics of HfO_2 High-k Gate Dielectric
HfO_2栅介质的表面界面特性研究
3.
Self-Assembled Monolayers Preparation of HfO_2 Thin Film
二氧化铪(HfO_2)薄膜的自组装制备
4.
Preparation and Property of High-k HfO_2 Gate Dielectric Materials
高介电常数HfO_2栅介质的制备及性能
5.
Study on Preparation and Properties of SiC/Si Heterostructures and Hafnium Oxide High-κ Thin Films;
SiC/Si异质结构和HfO_2高κ薄膜制备及其性能研究
6.
Study on HfO_2 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备HfO_2薄膜的研究
7.
Synthesis of Nanocrystalline Hafnium Oxide Thin Film by Self-Assembled Monolayer Method
二氧化铪（HfO_2）纳米晶态薄膜的自组装制备
8.
Preparation and characterization of patterned HfO_2 microstructures on silicon surface
硅基图案化HfO_2表面微结构的制备和表征
9.
Influences of deposition rate and oxygen partial pressure on residual stress of HfO_2 films
沉积速率和氧分压对HfO_2薄膜残余应力的影响
10.
Influence of HfO_2 contents in ZrO_2 raw material on the properties of Pb(Sb, Nb)O_3-Pb(Zr, Ti)O_3 piezoceramics
HfO_2含量对铌锑锆钛酸铅压电陶瓷性能的影响
11.
Self-Assembled Monolayers Preparation and Characterization of HfO_2 Film
二氧化铪(HfO_2)晶态薄膜的液相自组装制备与表征
12.
Dielectric properties and current conduction mechanism in pulsed laser deposited HfO_2 gate
脉冲激光沉积制备的HfO_2电学性能及其漏电流机制研究
13.
Exploring Theoretically Relationships between Electronic Structure and Optical Properties of Tetragonal HfO_2 Crystal for Polarization Directions(100) and(001)
四方晶相HfO_2在(100)和(001)方向上光学特性的理论计算
14.
First Principles Calculation of Electronic Structure and Elastic Constants of Tetragonal HfO_2 Crystal
四方晶相HfO_2电子结构和弹性常数的第一性原理计算
15.
Influence of Ta and TaN bottom electrodes on electrical performances of MIM capacitors with atomic-layer-deposited HfO_2 dielectric
Ta和TaN底电极对原子层淀积HfO_2介质MIM电性能的影响
16.
Physical and electrical properties of the high-κ dielectrics with Ni and Al inclusion in HfO_2
高介电栅介质材料HfO_2掺杂后的物理电学特性(英文)
17.
Interfacial and Electrical Characterization of HfO_2 Gate Dielectric Film with a Blocking Layer of Al_2O_3
具有Al_2O_3阻挡层的HfO_2栅介质膜的界面和电学性能的表征(英文)
18.
Influence of bias voltage of APS ion source on performance of hafnium films deposited with ion-assisted technology
离子束辅助工艺中APS源偏转电压对HfO_2薄膜性能的影响