1.
Research on High Quality Diamond Films in Microwave Plasma CVD;
微波等离子体化学气相沉积法制备高质量金刚石膜研究
2.
New-style Nano-sheets Carbon Films Fabricated by Microwave Plasma Chemical Vapor Deposition
微波等离子体化学气相沉积法制备的新型纳米片状碳膜(英文)
3.
plasma activated chemical vapour deposition
等离子体化学气相沉积
4.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
5.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
6.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
7.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
8.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
9.
One-dimensional Nanomaterials: Plasma and Chemical Vapor-Phase Synthesis and Characterizations;
等离子体及化学气相沉积法合成一维纳米材料及性能研究
10.
Preparation and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;
等离子体增强化学气相沉积方法制备碳纳米管及其表征
11.
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法.
12.
Study on the Growth of Carbon Nitride Filims by PE-CVD and the Related Gas-phase Reaction;
等离子体增强化学气相沉积法制备氮化碳薄膜及其气相反应过程研究
13.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
14.
Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;
ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
15.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
16.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
17.
Fabrication of germanium inverse opal three-dimensional photonic crystal by Low Temperature Plasma Enhance Chemical Vapour Deposition fill techniques
低温等离子体增强化学气相沉积填充法制备Ge反蛋白石三维光子晶体
18.
ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD
微波等离子体化学气相沉积金刚石薄膜形貌分析