1.
the emitting positions of the sputtered atoms are close to the corresponding incident ions (in the order of angstrom);
溅射原子的出射位置就在离子入射位置的附近(埃数量级);
2.
diode sputter-ion pump
二极管溅射离子泵[抽机]
3.
in line sputterer
直列式离子溅射装置
4.
plasma sputter combined etching
等离子溅射复合刻蚀
5.
THE SIMULATION RESEARCH ON ENERGY LOSS AND RANGE OF SPUTTERING IONS
离子溅射能量损失及射程的模拟研究
6.
Computer Simulation of the Transportation and the Sputtering of Ions in RF Magnetron Sputtering;
射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算
7.
Sputtering is the process in which material is removed from a surface as the result of a bombardment by atoms or ions with energies in excess of about 30eV.
溅射就是用能量大于30eV左右的原子或离子，轰击材料表面，把表面上的材料除掉的过程。
8.
low pressure triode method
低压三极管离子溅射方法
9.
Sandwich Type Distributed Sputtering Ion Pump with φb 6 mm Anode Holes
Φ6毫米阳极孔层状分布式溅射离子泵
10.
Research on Carbon Nitride Films Prepared by Ion Beam Sputtering;
离子束溅射法制备C-N薄膜的研究
11.
Growth of CuInSe_2 Films by Ion Beam Sputtering
离子束溅射制备CuInSe_2薄膜的研究
12.
In sputtering, argon is commonly used, havingthe advantage that it is an atomic gas and chemicallyinert.
溅射中我们通常使用氩,优点是氩是一种原子气体,而且在化学性质上是惰性的。
13.
Helium-charged Al films are prepared by direct current (DC) magnetron sputtering with a He/Ar mixture.
采用氦氩混合气氛下直流磁控溅射沉积方法制备含有氦原子的金属铝膜。
14.
Preparation of SiO_2 ion barrier film with RF magnetron sputtering
射频磁控溅射制备SiO_2防离子反馈膜工艺探讨
15.
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
离子束溅射沉积Ir膜真空紫外反射特性研究
16.
Plasma emission spectra of ZnO and ZAO thin film grown by RF magnetron sputtering
ZnO和ZAO薄膜磁控溅射等离子体发射光谱
17.
atomic radiation
原子放射，原子辐射
18.
Discussion on the Causes of Radial Discoloration of Electrophoresis Coating Film after Baking
关于电泳漆膜烘干后呈溅射状变色原因的探讨