1.
A Fast Method to Calculate Sparse Aerial Image Intensity for Lithography Simulation
用于光刻模拟的快速计算稀疏空间点光强的方法
2.
Method and Simulation of Micro Optical Elements Fabricated by Digital Lithography Technology;
数字光刻及其制作微光学元件的模拟研究
3.
Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings
光刻胶全息光栅显影监测的模拟与实验
4.
Modeling and implementation of a virtual lithography system for micromachines
面向微加工的虚拟光刻系统建模与实现
5.
Simulation Study on Influence of Hologram Quality on Reconstructed Pattern in AHL
全息片质量对原子全息光刻图形影响的模拟研究
6.
Study on Monte Carlo Simulation of Electron Beam Lithography and Proximity Effect Correction Technique;
电子束光刻的Monte Carlo模拟及邻近效应校正技术研究
7.
Study on Active Vibration-Reduction System of Simulated Vibration-Isolation Testing Table for Stepping and Scanning Lithography;
步进扫描光刻机模拟隔振试验平台主动减振系统研究
8.
Simulation of Point Based Rendering for Three Dimensional Lithography Development
用点渲染算法实现光刻胶显影过程的三维模拟(英文)
9.
electron chrome mask
电子束光刻用铬掩模
10.
analogultra-violet spectrophotometer
模拟紫外分光光度计
11.
Thermal Deformation of EUV Mask and its Influence on Lithographic Performance;
极紫外光刻掩模热变形及其对光刻性能的影响
12.
Dynamic Numerical Simulation for the Mechanism of V-shaped Notch Blasting
V形刻槽爆破机理动态数值模拟分析
13.
Simulations of Plasma Etching Based on Diffusion Limited Erosion Model
基于扩散限制刻蚀模型的等离子体刻蚀模拟研究
14.
coherent optical analogue computer
相干光学模拟计算机
15.
simulated optical range tester
模拟光学距离测试器
16.
The Simulation of AlGaInP LED's Light Output Efficiency
AlGaInP LED出光效率的模拟
17.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
18.
Fabrication of 2D Photonic Crystal Templates by Holographic Lithography and Soft Lithography;
基于全息光刻及软刻蚀技术制备二维光子晶体模板