1.
Numerical simulation of ultrafast energy transport in monocrystalline silicon films under femtosecond laser irradiation
飞秒激光辐照下单晶硅薄膜中超快能量输运的数值模拟
2.
Molecular Dynamics Simulation on In-Plane Thermal Conductivity of Single-Crystal Si Film at Nanoscale;
单晶硅纳米薄膜面向热导率的分子动力学模拟
3.
The Fabrication and Research of PIN Single Junction Amorphous Silicon Thin Film Solar Cells;
PIN单结非晶硅薄膜太阳能电池的制备及研究
4.
Single-chamber deposition of intrinsic microcrystalline silicon thin film and its application in solar cells
单室沉积本征微晶硅薄膜及其在电池中的应用
5.
Fabrication of P-type Amorphous Silicon Thin Films and Poly-Silicom by PECVD;
PECVD法制备P型非晶硅薄膜及多晶硅薄膜
6.
Metal-Induced Crystallization of Amorphous Silicon and Silicon Germanium Films
非晶硅和非晶硅锗薄膜的金属诱导结晶
7.
Preparation of Poly-Silicon Thin Film in Low Temperature Using SiH_4 as Gas Source by ECR-PECVD;
以硅烷为气源用ECR-PECVD制备多晶硅薄膜
8.
The Effect of Crystallization Ratio on Dark Conductivity of Poly-Silicon Thin Films;
多晶硅薄膜晶化率对暗电导率的影响
9.
Effect of thermal ammonia pretreatment on nanostructure of nickel thin films on single crystal silicon substrates
高温氨预处理对单晶硅衬底上镍薄膜显微结构的影响
10.
Research in Growth of Poly-Si_(1-x)Ge_x on SiO_2 by UHVCVD;
利用UHV/CVD在SiO_2薄膜上生长多晶锗硅薄膜的研究
11.
Study of High Image Quality Amorphous-Silicon Thin Film Transistor Liquid Crystal Displays
高像质非晶硅薄膜晶体管液晶显示器的研究
12.
The Preparation of Device-Quality Hydrogenated Amorphous Silicon Thin Films by Mwecr-Cvd Assisted by Hot-Wire;
热丝辅助MWECR-CVD制备器件级非晶硅薄膜
13.
Structure Analysis of Polycrystalline Silicon Films Prepared by ECR-PECVD at Low Temperature;
多晶硅薄膜ECR-PECVD低温生长结构研究
14.
Growth of Polycrystalline Silicon Thin Films on Flexible Substrate;
在柔性衬底上制备多晶硅薄膜的研究
15.
Low-temperature Deposition of Poly-silicon Thin Films by ECR-PECVD and Its Characteristic Analysis;
多晶硅薄膜的ECR-PECVD低温沉积及特性
16.
Research on Process of Polysilicon Nanofilm Pressure Sensor
多晶硅纳米薄膜压力传感器工艺研究
17.
Design of Polysilicon Nano-Film MEMS Pressure Sensor Structure
多晶硅纳米薄膜MEMS力敏结构研究
18.
Process Research on PECVD SiN-x:H Film for Crystalline Silicon Solar Cells
晶体硅太阳能电池PECVD SiNx:H薄膜工艺研究