1.
Growth of ZnO Films on Different Substrates by Metal Organic Chemical Vapor Deposition
不同衬底上氧化锌薄膜的金属有机化学气相沉积方法生长(英文)
2.
The Praparation and Chemical Mechanism of Functional Graded Materials Using Metal Organic Chemistry Vapour Deposition;
金属有机化学气相沉积法制备功能梯度材料的方法和机理的研究
3.
Research on Preparing Yttria Coatings by Metalorganic Chemical Vapor Deposition;
金属有机化学气相沉积法制备氧化钇涂层的探索研究
4.
Iridium Film Prepared by Metal-Organic Chemical Vapor Deposition
金属有机化合物化学气相沉积法制备铱薄膜的研究
5.
A New Preparation Technology of Mica Pearlescent Pigment by Metal Organic Chemistry Vapour Deposition (MOCVD) and Their Application;
金属有机化学气相沉积（MOCVD）法制备云母珠光颜料新工艺及应用研究
6.
Metal Organic Chemical Vapor Deposition( MOCVD) is a key technology in growing thin-films.
金属有机化学气相沉积(OCVD)一门制备薄膜材料的关键技术。
7.
Synthesis and Characterization of Novel Copper（Ⅰ）Complexes as Precursors for Metal-Organic Chemical Vapor Deposition;
Cu（Ⅰ）金属有机化学气相沉积前驱物的合成与表征
8.
The triangular pits eliminate of (110) a-plane GaN growth by metal-orgamic chemical vapor deposition
金属有机物化学气相沉积生长的a(110)面GaN三角坑缺陷的消除研究
9.
metallo organic chemical vapor deposition
有机金属化学汽相淀积
10.
Simulation and optimization design in MOCVD reactor
金属有机化学气相沉淀反应器结构的模拟优化
11.
Carbon nanotube reinforced metal matrix composites fabricated by in-situ chemical vapor deposition
原位化学气相沉积法制备碳纳米管增强金属基复合材料
12.
Morphology and defect of a-GaN grown by metal orgamic chemical vapor deposition
利用金属有机物化学气相沉积技术生长的a面GaN表面形貌和位错的研究
13.
The dry plating method is a method for deposition of a metal on the surface of polymer material under vacuum and includes sputtering method, vapor deposition, vacuum deposition, etc.
干镀是一种在真空下在聚合物表面沉积金属的方法，包括溅射、气相沉积、真空沉积等。
14.
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜,建立了热阴极等离子体化学气相沉积方法.
15.
Quantum chemistry methods and their applications to CVD reaction system
化学气相沉积反应研究的量子化学方法及应用
16.
Nanocrystalline Diamond Films Deposited by Hot Filament CVD
热丝化学气相沉积法制备纳米金刚石薄膜
17.
Preparation of Ultrananocrystalline Diamond Film by Chemical Vapor Deposition
化学气相沉积法制备超纳米金刚石薄膜
18.
Fluorides CVD Methods for Refractory Metal In CIS Countries (Ⅰ)
独联体国家的难熔金属氟化物化学气相沉积技术（上）