1.
Iridium Film Prepared by Metal-Organic Chemical Vapor Deposition
金属有机化合物化学气相沉积法制备铱薄膜的研究
2.
Synthesis and Characterization of Novel Copper（Ⅰ）Complexes as Precursors for Metal-Organic Chemical Vapor Deposition;
Cu（Ⅰ）金属有机化学气相沉积前驱物的合成与表征
3.
The triangular pits eliminate of (110) a-plane GaN growth by metal-orgamic chemical vapor deposition
金属有机物化学气相沉积生长的a(110)面GaN三角坑缺陷的消除研究
4.
Research on Preparing Yttria Coatings by Metalorganic Chemical Vapor Deposition;
金属有机化学气相沉积法制备氧化钇涂层的探索研究
5.
Growth of ZnO Films on Different Substrates by Metal Organic Chemical Vapor Deposition
不同衬底上氧化锌薄膜的金属有机化学气相沉积方法生长(英文)
6.
The Praparation and Chemical Mechanism of Functional Graded Materials Using Metal Organic Chemistry Vapour Deposition;
金属有机化学气相沉积法制备功能梯度材料的方法和机理的研究
7.
Metal Organic Chemical Vapor Deposition( MOCVD) is a key technology in growing thin-films.
金属有机化学气相沉积(OCVD)一门制备薄膜材料的关键技术。
8.
A New Preparation Technology of Mica Pearlescent Pigment by Metal Organic Chemistry Vapour Deposition (MOCVD) and Their Application;
金属有机化学气相沉积（MOCVD）法制备云母珠光颜料新工艺及应用研究
9.
metallo organic chemical vapor deposition
有机金属化学汽相淀积
10.
Morphology and defect of a-GaN grown by metal orgamic chemical vapor deposition
利用金属有机物化学气相沉积技术生长的a面GaN表面形貌和位错的研究
11.
Simulation and optimization design in MOCVD reactor
金属有机化学气相沉淀反应器结构的模拟优化
12.
Fluorides CVD Methods for Refractory Metal In CIS Countries (Ⅰ)
独联体国家的难熔金属氟化物化学气相沉积技术（上）
13.
thermochemistry of organometallic compounds
有机金属化合物热化学
14.
chemistry of organometallic compound
有机金属化合物化学
15.
Carbon nanotube reinforced metal matrix composites fabricated by in-situ chemical vapor deposition
原位化学气相沉积法制备碳纳米管增强金属基复合材料
16.
Chemical Bath Depositon for Metal Chalcogenide Photoelectric Functional Thin Films;
化学浴沉积制备金属硫族化合物光电功能薄膜
17.
Solubility of Metal Oganic Compound in Supercritical Carbon Dioxide and Its Supercritical Fluid Deposition;
金属有机化合物在超临界CO_2中的溶解与沉积研究
18.
thermally activated chemical vapour deposition
热活化化学气相沉积