1.
Preparation and Properties of Transparent and Conductive ZnO: Ga Film by DC Magnetron Reactive Sputtering;
直流磁控反应溅射制备ZnO：Ga薄膜及其性能研究
2.
Preparation of TiO_2 Thin Films by DC Magnetron Reaction Sputtering and Study on Oxygen-Sensing Properties;
直流磁控反应溅射制备TiO_2薄膜及氧敏特性研究
3.
Prepareation of Large Area Al-ZnO Thin Film by DC Magnetron Sputtering
直流磁控反应溅射法制备大面积AZO薄膜的实验研究
4.
Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备p型ZnMgO薄膜
5.
Na-doped p-type ZnO Thin Films Prepared by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Na掺杂p型ZnO薄膜
6.
Preparation of p-Type ZnMgO Thin Films Using Ga-N Codoping Method by Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Ga-N共掺p型ZnMgO薄膜
7.
The Microstrains Study of Au Films Prepared by DC Magnetron Sputtering
直流磁控溅射Au膜的微观应变研究
8.
Properties investigation of NiCr-CN thin films deposited by DC magnetron reactive sputtering
直流磁控反应溅镀NiCr-CN薄膜性能研究
9.
Preparation of p-type Transparent Conductive Tin-Antimony Oxide Thin Films by DC Magnetron Sputtering;
直流反应磁控溅射法制备p型透明导电锡锑氧化物薄膜
10.
Preparation and Properties of TiAlN Thin Films by Dual-target D.C. Reactive Magnetron Co-sputtering
双靶直流反应磁控共溅射沉积TiAlN薄膜及其性能研究
11.
Preparation of ITO thin film on the surface of AlMn alloy by direct-current reactive magnetron sputtering
铝锰合金表面直流反应磁控溅射制备氧化铟锡薄膜
12.
On the thin films prepared on 3003 aluminum foil surface by DC reactive magnetron sputtering
直流反应磁控溅射在3003铝箔表面制备薄膜的研究
13.
Effect of Technological parameters on deposition rate of ZAO films prepared by DC magnetron reactive sputtering
工艺参数对直流反应磁控溅射ZnO:Al薄膜沉积速率的影响
14.
Investigation of mechanical properties of ZrCN thin films fabricated by DC magnetron reactive sputtering
直流磁控反应溅镀ZrCN薄膜及其力学性能研究
15.
Investigation on Nanocrystalline Fe-N Thin Films Grown by Direct Current Magnetron Sputtering;
直流磁控溅射纳米晶Fe-N薄膜的研究
16.
PIC/MCC Simulation of Planar DC Magnetron Sputtering;
PIC/MCC模拟直流平面磁控溅射
17.
Research of ZnO Photoelectric Films by DC Magnetic Control Sputtering;
直流磁控溅射制备ZnO光电薄膜的研究
18.
Research of TiO_2 thin films prepared by DC magnetron sputtering
直流磁控溅射法制备TiO_2薄膜的研究