1.
Research on Preparation, Property and Device of Hydrogenated Silicon Films;
氢化硅薄膜的制备、特性及器件研究
2.
Research on Silicon Nitride Thin Film for Solar Cells and Hydrogen Passivation;
太阳电池用氮化硅薄膜及氢钝化研究
3.
The Research of Hydrogenated Nanocrystalline-Amorphous Silicon Thin-Film Solar Cells;
氢化纳米硅（na-Si：H）薄膜太阳电池研究
4.
Research Progress on the Hydrogen Content Control of Hydrogenated Amorphous Silicon Thin Films
氢化非晶硅薄膜H含量控制研究进展
5.
Experimental Study of Internal Friction of a-Si:H Films Charged with Hydrogen
氢化非晶态硅薄膜的渗氢内耗实验研究
6.
Optimized Growth Conditions and High Deposition Rate of μc-Si∶H Films
氢化微晶硅薄膜的两因素优化及高速沉积
7.
Study of a-Si:H Microstructure by MWECR CVD Technique;
MWECR CVD制备氢化非晶硅薄膜的微结构研究
8.
Study of Photoelectric Properties of a-Si:H Deposited by MW-ECR CVD;
MW-ECR CVD制备氢化非晶硅薄膜之光电特性研究
9.
Study on Mechanical Properties and Electronic Properties of Nc-Si:H Materials
氢化纳米硅薄膜力学及电学性质的研究
10.
Influence of Substrate Temperature on the Growth of μc-SiGe Thin Film
衬底温度对氢化微晶硅锗薄膜生长的影响
11.
Fabrication of Hydrogenarated Amorphous Silicon Thin Films by PECVD and the Study of Metal Induced Crystallization;
PECVD法制备氢化非晶硅薄膜及其金属诱导晶化研究
12.
Studies on Optical Constants and Room-Temperature Visible Luminescence of Hydrogenated Nanocrystalline Silicon Thin Films;
氢化纳米硅薄膜的光学常数和室温可见发光研究
13.
Investigation on Preparing an Even Large Area and Excellent Optoelectric Properties Hydrogenated Amorphous Silicon Film with Higher Rate;
高速沉积大面积均匀氢化非晶硅薄膜及其优异的光电特性的研究
14.
Studies of a-Si:H Microstructure by Hot Wire Assisted Mwecr CVD Technique;
热丝辅助MWECR CVD制备氢化非晶硅薄膜的微结构研究
15.
Research on the Preparation, Microstructure and Optoelectronic Properties of Hydrogenated Amorphous Silicon Thin Films
氢化非晶硅薄膜制备及其微结构和光电性能研究
16.
Structure and Properties of Hydrogenated Amorphous Silicon Thin Films by R.F and D.C Magnetron Sputtering
氢化非晶硅薄膜的直流和射频磁控溅射法制备及其表征
17.
Design of Hydrogenated Nanocrystalline Silicon Film's Gauge Factor Measurement System Based on Virtual Instrumentation Technology
基于虚拟仪器的氢化纳米硅薄膜应变系数测量系统的设计
18.
INVESTIGATION ON LARGE EVEN HYDROGENATED AMORPHOUS SILICON FILMS DEPOSITED BY HW-MWECR CVD SYSTEM
用HW-MWECRCVD系统沉积大面积均匀氢化非晶硅薄膜的研究