1.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
2.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
3.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
4.
plasma activated chemical vapour deposition
等离子体化学气相沉积
5.
Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;
ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
6.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
7.
Synthesis and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;
等离子体增强化学气相沉积制备碳纳米管及其表征
8.
Preparation and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;
等离子体增强化学气相沉积方法制备碳纳米管及其表征
9.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition
常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究
10.
Study on the Growth of Carbon Nitride Filims by PE-CVD and the Related Gas-phase Reaction;
等离子体增强化学气相沉积法制备氮化碳薄膜及其气相反应过程研究
11.
Mass spectrometry diagnosis in SiOx coating grown by PECVD plasma
等离子增强化学气相沉积制备氧化硅薄膜的质谱诊断研究
12.
Deposition of orthorhombic boron nitride films by plasma-enhanced pulsed laser deposition
等离子体增强脉冲激光沉积o-BN薄膜
13.
Fabrication of germanium inverse opal three-dimensional photonic crystal by Low Temperature Plasma Enhance Chemical Vapour Deposition fill techniques
低温等离子体增强化学气相沉积填充法制备Ge反蛋白石三维光子晶体
14.
The Effect of Bias on Low Pressure Plasma-Enhanced Chemical Vapour Deposition of TiO_2 Film and its Structure and Performance
偏压对低气压等离子体增强化学气相沉积TiO_2薄膜的结构和性能的影响
15.
Synthesis and Properties of Carbon-ZnO Composites by Plasma-enhanced Chemical Vapor Deposition
等离子体增强化学气相沉积制备碳素/氧化锌复合材料及其特性的研究
16.
Preparation of Diamond-like Carbon Film by Plasma Enhanced Chemical Vapor Deposition and Its Nano-mechanical Properties;
等离子体增强化学气相沉积法制备类金刚石膜及其纳米力学性能研究
17.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
18.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理