1.
Preparation technique and performances characterization of diamond-like carbon films by RFGDPECVD method
射频辉光放电等离子体辅助化学气相沉积法制备类金刚石碳膜工艺与性能表征
2.
plasma activated chemical vapour deposition
等离子体化学气相沉积
3.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜
4.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
5.
Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;
磁激活等离子体增强化学气相沉积设备的研制
6.
The Study on DLC Films Deposited by PECVD;
等离子体增强化学气相沉积DLC膜的研究
7.
Study on device of magneto-active PECVD;
磁激活增强等离子体化学气相沉积设备的研制
8.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
9.
Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;
ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
10.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
11.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
12.
ANALYSIS OF THE MORPHOLOGIES OF DIAMOND FILM GROWN BY MICROWAVE PLASMA CVD METHOD
微波等离子体化学气相沉积金刚石薄膜形貌分析
13.
NEW MICROWAVE PLASMA CVD SET UP FOR DIAMOND FILM GROWTH
新型微波等离子体化学气相沉积金刚石薄膜装置
14.
Research on High Quality Diamond Films in Microwave Plasma CVD;
微波等离子体化学气相沉积法制备高质量金刚石膜研究
15.
Study on Synthetic Silica Glass by Plasma Chemical Vapor Deposition;
等离子体化学气相沉积合成石英玻璃的基础研究
16.
Synthesis and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;
等离子体增强化学气相沉积制备碳纳米管及其表征
17.
One-dimensional Nanomaterials: Plasma and Chemical Vapor-Phase Synthesis and Characterizations;
等离子体及化学气相沉积法合成一维纳米材料及性能研究
18.
Preparation and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;
等离子体增强化学气相沉积方法制备碳纳米管及其表征