1.
Preparation and Structure of HfSi_xO_y Thin Film for High K Gate Dielectrics
高K栅介质HfSi_xO_y薄膜的制备工艺与结构分析
2.
Electrical Properties of High-k Gate Dielectric SiGe MOS Devices;
高k栅介质SiGe MOS器件电特性研究
3.
Study on Electrical Characteristics of Ge-pMOSFET with Ultrathin High-k Gate Dielectrics
超薄高k栅介质Ge-pMOSFET的电特性研究
4.
Gate Leakage Properties of Small-Scaled High-k Gate Dielectric MOS Devices;
小尺寸高k栅介质MOS器件栅极漏电特性研究
5.
Model and Technology of High-k Gate Dielectric MOS Devices;
高k栅介质MOS器件模型和制备工艺研究
6.
Studies on the High-K Gate Dielectrics MOSFET and Related Device Effects;
高K介质栅纳米MOSFET特性及相关器件效应的研究
7.
Threshold Voltage Model of Small MOSFET and Preparation of High-k Gate Dielectric;
小尺寸MOSFET阈值电压模型及高k栅介质制备
8.
Application of High-k Dielectrics to Floating Gate Nonvolatile Memory
高k介质在浮栅型非挥发性存储器中的应用
9.
Characterization of high-k gate dielectrics by atomic-resolution electron microscopy:current progress and future prospects
高k栅介质原子分辨率的电镜表征:研究进展和展望(英文)
10.
Physical and Electrical Properties of ZrO_2 Gate Dielectrics Film
高介电栅介质ZrO_2薄膜的物理电学性能
11.
Preparation and Property of High-k HfO_2 Gate Dielectric Materials
高介电常数HfO_2栅介质的制备及性能
12.
Research on the Fabrication of High-k Dielectric Films and the Discussion of Integrated Thin Film Capacitor;
高k电介质薄膜制备研究与集成薄膜电容探讨
13.
Latest Development of Integration of High-k/Dual Metal Gate in Gate First Process
先栅工艺中高K/双金属栅集成研究新进展
14.
Thermal stability and electrical properties of high-k LaErO_3 films
作为高介电常数栅介质材料的LaErO_3薄膜热稳定性和电学性质的研究
15.
Modeling and Preparation of High-κ Gate Dielectric Ge-Based MOS Devices;
高κ栅介质Ge基MOS器件模型及制备工艺研究
16.
The Study of Optical and Electrical Properties of High K Dielectric Poly(Vinylidene Fluoride-trifluoroethylene) Copolymer;
高K介质材料偏氟乙烯和三氟乙烯共聚物光学和电学性质的研究
17.
Fabrication and Characteristics Study of Hf-based High-k Gate Dielectrics Thin Films;
铪基高介电常数栅介质薄膜的制备及其物性研究
18.
Physical and electrical properties of the high-κ dielectrics with Ni and Al inclusion in HfO_2
高介电栅介质材料HfO_2掺杂后的物理电学特性(英文)