1.
Study on Laser Interferometric Lithography Technology Based on Multi-beam Interference;
基于多光束相干的激光干涉光刻技术研究
2.
An experimental double-beam and double-exposure interference photolithographic system has been established.
建立了双光束双曝光干涉光刻实验系统。
3.
Diffraction Spatial Imaging by Using the Technology of Consecutive Variable-pitch Dot Matrix Grating;
用于衍射空间成像的连续变空频干涉光刻技术
4.
The research results show that IIL can get the high resolution more effectively than conventional optical lithography (OL).
研究结果表明，掩模投影成像干涉光刻技术比传统投影光刻能够得到更高的光刻分辨率。
5.
The beam division method in maskless laser interference photolithography can be divided into wave-front division and amplitude division.
无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
6.
Research on the Interference Nanosecond Laser Ablation of Micro-grating Structures on the Silicon Surface
硅表面微光栅结构的纳秒激光干涉刻蚀研究
7.
Optical head supporting sub wavelength structure with UV interference lithography
支持亚波长结构光刻的紫外干涉光学头
8.
optical interference filter, unmounted
光学干涉滤光片,未装配
9.
constant angle reflection interference spectroscopy
恒定角反射干涉光谱学
10.
constant angle transmission interference spectroscopy
恒定角透射干涉光谱学
11.
laser image-speckle interferometer
激光影像-斑点干涉仪
12.
multiple beam lateral-shear interferometer
多光束横向切变干涉仪
13.
infrared prism interferometer-spectrometer
红外棱镜干涉光谱仪
14.
multiple exposure interferometry
多次曝光干涉量度学
15.
totally reflective interference photocathode
全反射干涉式光电阴极
16.
three laser intercavity interferometer
三激光器内腔干涉仪
17.
time-resolved interference spectroscopy
时间分辨干涉光谱学
18.
interferometric fiber optic accelerometer
干涉型光纤加速度计