1.
Study on the Characteristic of Appearance of Multilayer Dielectric Grating Mask;
多层介质膜光栅掩膜形貌特性的研究
2.
Silicon Nitride Thin Film Deposited by PECVD as a Protecting Layer on Photolithography Mask
PECVD淀积Si_3N_4作为光刻掩膜版的保护膜
3.
Study on Microfabrication of AFM Probes Based on Masked-Maskless Combined Etching Technologies;
基于掩膜—无掩膜腐蚀技术的AFM探针制作方法研究
4.
The substrate is first covered by a mask.
首先在基片上覆盖一个掩膜片。
5.
Application of Counter-peaked Mask and Gabor Filter to Fingerprint Image Enhancement
掩膜法与Gabor滤波在指纹增强中的应用
6.
Mark micromachining laser scanning system controlled by microcomputer
掩膜微加工激光扫描单片机控制系统
7.
A Mask Embedded SPIHT Algorithm for Arbitrary Shape ROI Coding
嵌入掩膜的SPIHT任意形状ROI编码
8.
Phase Shift Mask Monitor Scanner Focus;
利用相移光刻掩膜版监测光刻机台焦距
9.
The Feasibility of Forming Sheet Silicon s Hard Mask by Thermal Oxidation Technology;
关于硅基片硬质掩膜形成的可行性研究
10.
The Design and Implementation of Data Storage Management System in Photomask Manufacture
光掩膜生产中数据存储管理系统的设计与实现
11.
Progress in Mask Materials Used for Super-RENS Optical Storage
用于超分辨近场结构光盘存储的掩膜材料
12.
Controlled fabrication of Si nanocones by using diamond film as a mask under ion beam sputtering
金刚石薄膜为掩膜离子束室温溅射可控制备硅纳米圆锥阵列
13.
An image of the patterns on the mask is projected onto the resist-coated wafer, which is many centimeters away.
掩膜板上图形的像被投影到许多厘米以外的涂有抗蚀剂的片子上。
14.
Study on the Nd:KGW Pulse Solid Laser Mask Machining Control System of LPC2210 Micorcontroller;
LPC2210单片机的KGW脉冲固体激光掩膜加工控制系统研究
15.
Fabrication and Characterization of General Microcups with Flexibility and Solvent-resistance by UV Photo-mask Lithography
掩膜光刻法制备柔性抗蚀电子纸微杯及其性能表征
16.
Selective Emitter Silicon Solar Cells with Silicon Nitride Mask
氮化硅掩膜法制备选择性发射极晶体硅太阳电池
17.
High quality GaN film was grown by hydride vapor phase epitaxy(HVPE) using porous AAO as mask.
采用均匀的多孔阳极氧化铝做掩膜在氢化物气相外延设备中生长出高质量的氮化镓膜。
18.
Chrome thin films for hard surface photomasks
GB/T15870-1995硬面光掩模用铬薄膜