1.
Thermodynamic Study on CVD Tungsten Silicide System
化学气相淀积硅化钨体系热力学研究
2.
The higher value is comparable to those obtained in CVD epitaxy.
这个高的数值可以和从化学气相淀积外延得到的数值相比拟。
3.
Self-Organized Growth of Ge Quantum Dots by UHV/CVD
超高真空化学气相淀积自组织生长锗量子点(英文)
4.
photochemical vapor deposition oxide
光化学汽相淀积氧化物
5.
metallo organic chemical vapor deposition
有机金属化学汽相淀积
6.
cvd polysilicon
化学汽相淀积多晶硅
7.
plasma chemical vapor deposition
等离子体化学汽相淀积
8.
modified chemical vapor deposition
改进的化学汽相淀积
9.
chemical vapor deposition reactor
化学汽相淀积反应器
10.
thermally activated chemical vapour deposition
热活化化学气相沉积
11.
plasma activated chemical vapour deposition
等离子体化学气相沉积
12.
epitaxial CVD growth
外延化学气相沉积生长
13.
Simulation and optimization design in MOCVD reactor
金属有机化学气相沉淀反应器结构的模拟优化
14.
laser induction chemical vapor deposition method
激光诱导化学气相沉淀法（制纳米微粒的方法）
15.
Tentative Experiment of Synthesizing Single-Crystal Diamond Films by Chemical Vapor Deposition
化学气相沉淀法合成单晶金刚石膜实验探索
16.
The Research on the Gas Phase Process of Electron-Assisted Chemical Vapor Deposition from CH_4/H_2 Mixture Gas;
CH_4/H_2系统电子助进化学气相沉积气相过程研究
17.
Study of CVD Function coating on Molybdenum Substrate
钼表面化学气相沉积功能涂层的研究
18.
Preparation of SiC Filament by Chemical Vapor Deposition;
化学气相沉积法制备钨芯SiC纤维