1.
chemically polished chip
化学抛光管芯, 化学抛光微晶粒
2.
A CNC Chemical Etching Technology of Optics Suface Based on the Marangoni Effect;
基于Marangoni效应的数控化学抛光工艺研究
3.
A Experimental Study on Chemical Polishing of Dental Cast Titanium Prosthesis;
口腔铸钛修复体化学抛光的实验研究
4.
Study on Tribochemical Polishing Technique of CVD Diamond Film;
CVD金刚石膜摩擦化学抛光技术研究
5.
A Research on the Influence of Electrochemistry Polishing on 1Cr18Ni9Ti Properties;
电化学抛光对1Cr18Ni9Ti性能的影响研究
6.
Development of Wheel for CVD Diamond Thermo-Chemical Polishing
CVD金刚石膜热化学抛光盘的研制
7.
Modeling method research of mould steel by pulse electrochemical polishing
模具钢脉冲电化学抛光建模方法研究
8.
Study on Surface Chemical Polishing of HgInTe Wafers
HgInTe晶片表面化学抛光研究
9.
PROCESS AND MECHANISM OF CHEMICAL POLISHING OF AM60 MAGNESIUM ALLOY WITH A H_3PO_4 CONTAINING LIQUOR
AM60镁合金化学抛光的工艺及机理研究
10.
The Research on Chemical Polishing and Chemical Conversion Coating on AM60 Magnesium Alloy
AM60镁合金化学抛光及化学转化膜的研究
11.
Study on Conditioner for Polishing Pad in CMP;
化学机械抛光用抛光垫修整器的研究
12.
Study on Electrochemical Mechanism and Polishing Rate of Chemical-Mechanical Polishing of Copper;
铜化学-机械抛光电化学机理与抛光速率的研究
13.
Study on Conditioning Technology of Polishing Pad in CMP;
化学机械抛光中抛光垫修整技术的研究
14.
Chemical mechanical polishing for silicon wafer by composite abrasive slurry
利用复合磨粒抛光液的硅片化学机械抛光
15.
Study on Electrochemistry and Polishing Rate of Chemical Mechanical Polishing of Semiconductor Silicon Wafer;
半导体硅片化学机械抛光电化学与抛光速率研究
16.
Influence of abrasive and chemical composition on chemo-mechanical polishing of MgO single crystal substrate
抛光液中磨料和化学成分对单晶MgO基片化学机械抛光的影响
17.
Study on CMP Slurry of CVD Diamond Film;
CVD金刚石膜化学机械抛光液的研制
18.
A Test Study On Electrochemical Mechanical Finishing D60 Tungsten Steel
D60钨钢电化学机械复合抛光试验研究