1.
Deposition rate is increase quickly with sputtering power.
结果表明溅射功率对沉积速率的影响最大，随溅射功率的增大沉积速率快速增大。
2.
Directly Grown Ca_2Si Films on Si(100) Substrate at Various Radio-Frequency Sputtering Power
不同射频溅射功率下直接制备Ca_2Si薄膜(英文)
3.
Influence of RF sputtering power and doped hydrogen on the structure of Si∶Hfilms
射频溅射功率和掺杂氢对硅氢薄膜结构的影响
4.
High sputtering power produces an amorphous Cr-N film.
过高的溅射功率使薄膜以非晶态的形式存在。
5.
Effect of sputtering power on properties of ZnO:Zr films deposited on PET substrate
溅射功率对PET衬底上ZnO:Zr薄膜性能的影响
6.
Effect of Sputtering Power on Photoelectric Properties of Dye-Sensitized TiO2 Electrodes
溅射功率对染料敏化TiO_2电极光电性质的影响
7.
Influence of sputtering power on cyclic performance of Sb thin films as anodes of lithium ion battery
溅射功率对Sb薄膜负极材料循环性能的影响
8.
Influence of sputtering power on cyclic performance of Sn thin films as anode of lithium ion battery
溅射功率对Sn薄膜负极材料循环性能的影响
9.
The Effect of RF Power and Working Gases on the Dielectric Properties of Sialon Thin Films
溅射功率和气氛对Sialon薄膜介电性能的影响
10.
Effects of the Sputtering Power on the Photoelectric Properties of ZnO Transparent Conductive Oxide Thin Films
射频溅射功率对ZnO透明导电薄膜光电性能的影响
11.
Study of Structure and Optical Properties of Aldoped ZnO Nanofilms Prepared in different Ar/O_2 and Sputtering Power
氧氩比与溅射功率等对Al掺杂ZnO薄膜结构和光学特性影响的研究
12.
Influence of dc power and oxygen partial pressure on the electrical and optical properties of indium-tin-oxide films
溅射功率和氧分压对ITO薄膜光电性能的影响研究
13.
Influence of argon ion bombardment and sputtering power on the structure and properties of Cu thin film
氩离子轰击和溅射功率对Cu薄膜结构及性能的影响
14.
The results show that the sputtering power significantly affects the compactness of the A1 film.
初步探讨了溅射功率、气压和时间等不同溅射参数对铝层结构和铝层在氟塑料表面附着情况的影响。
15.
Development of high-power pulse magnetron sputtering technology
高功率脉冲磁控溅射技术的发展与研究
16.
Influence of Deposition Power of the Diamond-like Carbon Films Prepared by Medium Frequency Reactive Deposition
中频磁控溅射制备a-C∶H薄膜中沉积功率的影响
17.
Study on Influence of Target Powers on Properties of Diamond-Like Carbon Films Deposited by Mid-Frequency Magnetron Sputtering System
中频磁控溅射制备类金刚石薄膜的功率因素研究
18.
Deposition Rate of Thin Silicon Oxide Film by Magnetron Sputtering Method
磁控溅射制备氧化硅薄膜生长速率(英文)