1.
Study of AlN Thin Films Deposited on Mo Electrode by Reactive Magnetron Sputtering
Mo电极上磁控反应溅射AlN薄膜
2.
Study on HfO_2 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备HfO_2薄膜的研究
3.
Study on Y_2O_3 Thin Film by RF Magnetron Reactive Sputtering;
射频磁控反应溅射法制备Y_2O_3薄膜的研究
4.
Preparation and Properties of Transparent and Conductive ZnO: Ga Film by DC Magnetron Reactive Sputtering;
直流磁控反应溅射制备ZnO：Ga薄膜及其性能研究
5.
Preparation of TiO_2 Thin Films by DC Magnetron Reaction Sputtering and Study on Oxygen-Sensing Properties;
直流磁控反应溅射制备TiO_2薄膜及氧敏特性研究
6.
Yttrium Doped TiO_2 Films Prepared by DC Reactive Magnetron Sputtering
磁控反应溅射制备钇掺杂TiO_2薄膜的研究
7.
Research on the Microstructure and Electric Breakdown Strength of Silicon Oxide Thin Film Deposited by RF Magnetron Reactive Sputtering
射频磁控反应溅射氧化硅薄膜微结构和电击穿场强研究
8.
The Research on TiN Films Deposited by Magnetron Sputtering;
反应磁控溅射法制备TiN薄膜的研究
9.
Deposition of p Type ZnMgO Thin Films by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备p型ZnMgO薄膜
10.
Preparation of Nanomaterials by Hydrothermal and Reactive Radio-frequency Magnetron Sputtering;
水热法及反应磁控溅射制备纳米材料
11.
Growth Behavior of ZnO Film Deposited on Si Substrate by Reactive Magnetron Sputtering;
反应磁控溅射ZnO薄膜在Si基片上的生长行为
12.
VO_2 Thin Films Deposited by Reactive Magnetron Sputtering Method and Its Surface Performance Study;
反应磁控溅射制备VO_2薄膜及表面特征研究
13.
Na-doped p-type ZnO Thin Films Prepared by DC Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Na掺杂p型ZnO薄膜
14.
Study on MQWs and Alloy of ZnO Films Made by Reactive Magnetron Sputtering;
反应磁控溅射ZnO薄膜多量子阱及合金特性研究
15.
Preparation of p-Type ZnMgO Thin Films Using Ga-N Codoping Method by Reactive Magnetron Sputtering;
直流反应磁控溅射法制备Ga-N共掺p型ZnMgO薄膜
16.
Preparation and Phase Transition Properties of VO_2 Thin Films by Reactive Magnetron Sputtering;
反应磁控溅射法制备VO_2薄膜及其相变特性研究
17.
Microstructures and Mechanical Properties of Vanadium Carbide Films Grown by Reactive Magnetron Sputtering
反应磁控溅射碳化钒薄膜的微结构与力学性能
18.
Process Control of High Reflectance Mirrors Preparation in Transition Region by Reactive Magnetron Sputtering
在反应磁控溅射过渡区制备高反射膜的工艺控制