1.
photoresist controlled etch
光刻胶掩蔽控制腐蚀
2.
The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;
化学增幅光刻胶及其在电子束光刻中的应用
3.
Optical properties and process of the diluted SU8 resist
改性SU8光刻胶的光学特性及其工艺
4.
Study on Synthesis of Photoresist and Photochemical Process for Information Recording in Laser Disc
激光光盘信息记录光刻胶的合成与感光
5.
Development of a High ThermoStability UV Positive Photoresist and a 248nm Deep-UV Photoresist;
耐高温紫外正型光刻胶和248nm深紫外光刻胶的研制
6.
This photoresist have thermal stabilityand high resolution.
该光刻胶具有热稳定性和高分辨率性。
7.
photoresist edge build up
硅片边缘上光刻胶的积累
8.
ozone induced scumming
臭氧感生未显影光刻胶形成
9.
Study of a UV Positive Photoresist and Photoacid Generators for 248nm Deep-UV Photoresist;
紫外正型光刻胶及248nm产酸剂的研制
10.
Experimental Study on Ultrasonic Stress Relief Used in SU-8 Photoresist;
SU-8光刻胶超声时效的实验研究
11.
Aqueous-soluble Hyperbanched Polyesters: Snthesis and Photoresists for Microoptics;
高支化碱溶性聚酯的合成及其微光学光刻胶
12.
Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;
光刻胶全息光栅掩模槽形的控制和检测
13.
Effective Red Fluorescence of Eu(TTFA)_3-doped Epoxy-based Photoresist Polymer Film
Eu(TTFA)_3掺杂环氧基光刻胶薄膜的强烈红色荧光
14.
Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings
光刻胶全息光栅显影监测的模拟与实验
15.
Multilayer Dielectric Gratings: In-situ Monitoring of Duty Cycle of photoresist Mask and Ion-Beam-Etched Groove Depth;
介质膜光栅：光刻胶掩模占宽比和离子束刻蚀槽深的监控
16.
Study on the Improvement of Ashing Rate of Photoresist Ashing Process with CF4 Gas;
含氟气体的去光刻胶工艺灰化率提高的研究
17.
Optical Radiative Transition Characteristics of Eu(TTFA)_3-Doped Resin Photoresist Polymer Film
树脂型光刻胶薄膜中Eu~(3+)的辐射跃迁特性
18.
The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms
光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响