1.
Study of MoS_2-Ti Composite Coatings Deposited by Unbalanced Magnetron Sputtering;
非平衡磁控溅射沉积MoS_2-Ti复合薄膜研究
2.
Studies in the Technologies for the a-C:H Films Prepared by Middle Frequency Unbalanced Magnetron Sputtering;
中频非平衡磁控溅射制备DLC膜的工艺研究
3.
Study on NiCoCrAlY Coating Using Unbalanced Magnetron Sputtering on Titanium Alloy Surface
钛合金表面非平衡磁控溅射沉积NiCoCrAlY涂层
4.
Analysis of Structure of Cr-doped GLC Coatings Deposited by Unbalanced Magnetron Sputtering
非平衡磁控溅射掺Cr类石墨镀层的结构分析
5.
Microstructures and Properties of Silicon Nitride Films Grown by Unbalanced Magnetron Sputtering
非平衡磁控溅射制备氮化硅薄膜及其性能研究
6.
Influence of oxidation temperature on microstructure and properties of unbalanced magnetron sputtered TiN coatings
热氧化温度对非平衡磁控溅射TiN镀层的影响
7.
Bias Voltage and Mechanical Properties of CrN Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering
封闭磁场非平衡磁控溅射偏压对CrN镀层摩擦学性能影响
8.
Software Design of Real-time Monitoring System of Unbalanced Magnetron Sputtering Ion-plating Equipment in Closed Field;
闭合场非平衡磁控溅射离子镀装备实时监控系统软件设计
9.
Discharge Properties of Unbalanced Magnetron Sputtering System and Application of TiN_x Films Deposition;
非平衡磁控溅射沉积系统放电特性和沉积TiN_x薄膜应用研究
10.
MW-ECR Plasma Enhanced Unbalance Magnetron Sputtering and Carbon Nitride Films Preparation;
微波-ECR等离子体增强非平衡磁控溅射技术及CN薄膜的制备研究
11.
Fabrication of Diamond-like Carbon Films by Ion Enhanced Middle Frequency Unbalanced Magnetron Sputtering;
离子辅助中频非平衡磁控溅射制备类金刚石薄膜
12.
Research of Ti-N-C Films Deposited by Ion Beam Assistant MF Twin Target Unbalanced Magnetron Sputtering;
离子束辅助中频非平衡磁控溅射制备Ti-N-C膜的研究
13.
Studies on Discharge Characteristics and Applications of ICP Enhanced Unbalanced Magnetron Sputtering in Cusp-field Confined Magnetron;
会切场约束ICP增强非平衡磁控溅射放电及应用研究
14.
Study on Microstructure and Properties of CrAlN Coatings Deposited by Closed Field Unbalanced Megnetron Sputtering
闭合场非平衡磁控溅射沉积的CrAlN薄膜组织结构和性能研究
15.
Tribological Properties of Ti-DLC Film Deposited by Mid-frequency Dual-magnetron Sputtering
中频非平衡磁控溅射沉积Ti-DLC膜摩擦磨损性能研究
16.
Effect of the background vacuum degree on the properties of the C/Cr coating deposited by non-equilibrium magnetron sputtering
本底真空度对非平衡磁控溅射C/Cr复合镀层性能的影响
17.
Study on Oxidation Resistant Behavior at High-temperature of TiN,TiAlN Coatings Prepared by Unbalanced Magnetron Sputtering
非平衡磁控溅射离子镀TiN、TiAlN涂层抗高温氧化行为的研究
18.
Effect of Target Current on Structure and Characteristics of the Hydrogen-free Carbon Films by Unbalanced Magnetron Sputtering
靶电流对非平衡磁控溅射制备无氢碳膜结构与性能的影响