1.
A Study on Atmospheric Pressure Chemical Vapor Deposition of TiN Film and Its Kinetics;
TiN薄膜常压化学气相沉积及动力学研究
2.
A Ti_5Si_3 THIN FILM AND ITS COATING GLASS DEPOSITED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION METHOD
常压化学气相沉积法制备Ti_5Si_3薄膜及其镀膜玻璃
3.
Preparation of TiO_2 Films by Atmospheric Pressure Chemical Vapor Deposition & Study of Doping Properties;
常压化学气相沉积法二氧化钛薄膜的制备与掺杂性能研究
4.
Preparation of self-cleaning glass coated with TiO_2 on a float glass line by APCVD method
在线常压化学气相沉积方法制备TiO_2自洁薄膜玻璃(英文)
5.
Preparation and Study of TiO_2 Films and Doped TiO_2 Films by Continuous-Fast Atmospheric Pressure Chemical Vapor Deposition;
连续快速常压化学气相沉积法制备二氧化钛与掺杂二氧化钛薄膜及其性能的研究
6.
The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;
常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
7.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-enhanced Chemical Vapor Deposition;
常压等离子化学气相沉积纳米晶TiO_2多孔薄膜的研究
8.
Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition
常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究
9.
thermally activated chemical vapour deposition
热活化化学气相沉积
10.
plasma activated chemical vapour deposition
等离子体化学气相沉积
11.
epitaxial CVD growth
外延化学气相沉积生长
12.
Atmospheric-pressure Plasma Chemical Vapor Deposition for Polycrystalline Silicon Preparation from SiCl_4 and OES Diagnosis
由SiCl_4制备多晶硅的大气压等离子体化学气相沉积及发射光谱诊断
13.
Fabrication of Silicon Inverse Opal Three-Dimensional Photonic Crystal Using Lpcvd/Template Techniques;
低压化学气相沉积/模板技术制备硅反蛋白石三维光子晶体
14.
The Study of Diamond Films and Its Composite Films Deposited by Bias Voltage HFCVD;
偏压热丝化学气相沉积金刚石膜及其复合膜的研究
15.
Synthesis of Carbon Nanotubes by Low Pressure Chemical Vapor Deposition and Their Applications
碳纳米管的低压化学气相沉积法制备及其应用研究
16.
Effect of Oxygen Partial Pressure on the Morphology of ZnO Nanostructure Prepared by Chemical Vapor Deposition
氧分压对化学气相沉积法合成ZnO纳米结构形貌的影响
17.
Fabrication of Germanium Inverse Opal Three-dimensional Photonic Crystal by LPCVD
低压化学气相沉积技术制备锗反蛋白石三维光子晶体
18.
Study of CVD Function coating on Molybdenum Substrate
钼表面化学气相沉积功能涂层的研究