1.
Electron Beam Vapor Deposited La_2Zr_2O_7 Thermal Barrier Coaings
电子束物理气相沉积La_2Zr_2O_7热障涂层研究
2.
Progress in EB-PVD Thermal Barrier Coatings
电子束物理气相沉积热障涂层技术研究进展
3.
Microstructure and Property Research on TiAl-Based Alloy Sheet Fabricated by EB-PVD;
电子束物理气相沉积制备TiAl基合金薄板的组织性能研究
4.
Microstructure of As-Deposited Ni-Cr-Al Alloy Thin Sheet by EBPVD
电子束物理气相沉积Ni-Cr-Al合金薄板微观组织研究
5.
Application of Thermal-spraying and Electron Beam Physical Vapor Deposition Technologies on Preparation of Thermal Barrier Coatings
热喷涂及电子束物理气相沉积技术在热障涂层制备中的应用
6.
Modification of silk fabric via atmospheric pressure plasma liquid deposition
丝织物的大气压等离子体液相沉积处理
7.
The Research on the Gas Phase Process of Electron-Assisted Chemical Vapor Deposition from CH_4/H_2 Mixture Gas;
CH_4/H_2系统电子助进化学气相沉积气相过程研究
8.
Study of Oxide Optical Films Deposited by Bias-Voltage E-Beam Evaportation;
偏压电子束蒸发沉积氧化物光学薄膜研究
9.
plasma activated chemical vapour deposition
等离子体化学气相沉积
10.
Preferred Orientation of Vapor-deposited Thin Films and Valence Electron Structure Analysis;
气相沉积薄膜的择优取向及其价电子结构分析
11.
Study on the Tribological Behaviors of Physical Vapor Deposition (PVD) Coatings;
物理气相沉积（PVD）涂层的摩擦学行为研究
12.
The Application and Development of Physical Vapor Deposition on Molds;
物理气相沉积技术在模具中的应用及发展
13.
Research and Prospect on Binding Force for PVD TiN Coating
物理气相沉积TiN涂层结合力的研究现状与展望
14.
Prospect and Current Status of Research on Physical Vapor-Deposited TiN Coating
物理气相沉积TiN涂层的研究现状与展望
15.
WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP
微波等离子体化学气相沉积装置的工作原理
16.
Apply PVD Process Instead of CVD to Deposit TIN Barrier Layer in Semiconductor Manufacture
在半导体制造中使用物理气相沉积代替化学气相沉积来生长氮化钛阻挡层
17.
Application of chemical vapor deposition for electrode materials of lithium ion batteries
化学气相沉积技术在锂离子电池电极材料中的应用
18.
TEM Study on Diamond Films Deposited by MPCVD;
微波等离子体化学气相沉积金刚石薄膜的电子显微学分析