1.
The Praparation and Chemical Mechanism of Functional Graded Materials Using Metal Organic Chemistry Vapour Deposition;
金属有机化学气相沉积法制备功能梯度材料的方法和机理的研究
2.
Research on Preparing Yttria Coatings by Metalorganic Chemical Vapor Deposition;
金属有机化学气相沉积法制备氧化钇涂层的探索研究
3.
Growth of ZnO Films on Different Substrates by Metal Organic Chemical Vapor Deposition
不同衬底上氧化锌薄膜的金属有机化学气相沉积方法生长(英文)
4.
Metal Organic Chemical Vapor Deposition( MOCVD) is a key technology in growing thin-films.
金属有机化学气相沉积(OCVD)一门制备薄膜材料的关键技术。
5.
Synthesis and Characterization of Novel Copper（Ⅰ）Complexes as Precursors for Metal-Organic Chemical Vapor Deposition;
Cu（Ⅰ）金属有机化学气相沉积前驱物的合成与表征
6.
A New Preparation Technology of Mica Pearlescent Pigment by Metal Organic Chemistry Vapour Deposition (MOCVD) and Their Application;
金属有机化学气相沉积（MOCVD）法制备云母珠光颜料新工艺及应用研究
7.
Iridium Film Prepared by Metal-Organic Chemical Vapor Deposition
金属有机化合物化学气相沉积法制备铱薄膜的研究
8.
The triangular pits eliminate of (110) a-plane GaN growth by metal-orgamic chemical vapor deposition
金属有机物化学气相沉积生长的a(110)面GaN三角坑缺陷的消除研究
9.
metallo organic chemical vapor deposition
有机金属化学汽相淀积
10.
Simulation and optimization design in MOCVD reactor
金属有机化学气相沉淀反应器结构的模拟优化
11.
Morphology and defect of a-GaN grown by metal orgamic chemical vapor deposition
利用金属有机物化学气相沉积技术生长的a面GaN表面形貌和位错的研究
12.
Fluorides CVD Methods for Refractory Metal In CIS Countries (Ⅰ)
独联体国家的难熔金属氟化物化学气相沉积技术（上）
13.
Carbon nanotube reinforced metal matrix composites fabricated by in-situ chemical vapor deposition
原位化学气相沉积法制备碳纳米管增强金属基复合材料
14.
thermally activated chemical vapour deposition
热活化化学气相沉积
15.
plasma activated chemical vapour deposition
等离子体化学气相沉积
16.
epitaxial CVD growth
外延化学气相沉积生长
17.
Effects of deposition parameters on CVD nanocrystalline diamond thin films
沉积参数对化学气相沉积纳米金刚石薄膜的影响
18.
Diamond thin films grown up by microwave plasma CVD
微波等离子体化学气相沉积金刚石簿膜