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1)  Coulomb staircase effect
库仑台阶效应
2)  Coulomb staircase
库仑台阶
1.
The generation mechanisms of these physical phenomena of Coulomb blockade, Coulomb staircase, single electron tunneling were described with single electron transistor(SET) as the research object.
以单电子晶体管为研究对象,系统阐述了库仑阻塞、库仑台阶、单电子隧穿等物理现象的产生机理。
2.
Discontinuities of the slope of the curve at the flat form of Coulomb staircase compared to double barrier tunnel junction system, which is caused by the change of the electron num.
发现其有别于双势垒隧穿结的情况 ,在传统库仑台阶的平台处曲线存在波纹状结构 ,分析得出这是由于第二个库仑岛上的电子数变化对I V曲线的影响 。
3.
It can also be used to analyze the influence of tunnel resistances on the Coulomb staircase and the conductance oscillations quantitatively and to obtain the condition for the generation of single electron phenomena.
应用该方法计算和分析了温度和栅压对单电子晶体管I V 特性的影响 ,研究了隧道结电阻对于库仑台阶及电导振荡的影响 ,分析了单电子现象产生的条件 。
3)  Coulomb effect
库仑效应
1.
Within the framework of Eikonal multiple-scattering theory, the Coulomb effect in π±-40Ca elastic scattering is studied.
在Eikonal多次散射理论的框架下,探讨了库仑效应对π~±-~(40)Ca弹性散射的影响。
4)  multistip-like behavior
台阶效应
1.
To reduce the influence of multistip-like behavior in rapid prototyping manufacturing on the precision of parts,the mathematical principle of multistip-like behavior as well as the corresponding precision loss of parts and the characteristic distortion or defect were analyzed.
为减小快速成型制造中台阶效应对制件精度的影响,从原理上对台阶效应存在的数学原理、导致制件精度的损失、成型件表面及形状的影响、造成的特征缺损或特征畸变进行了分析。
5)  Coulomb blockade effect
库仑阻塞效应
1.
The I-V curve of the tunneling junction at room temperature clearly indicates the Coulomb blockade effect.
钛氧化线的宽度为60·5nm,在室温下此隧道结的I-V曲线表现出明显的库仑阻塞效应。
2.
The studies contain the quantum squeezing effect in the mesoscopic LC circuit and the Coulomb blockade effect in the mesoscopic capacitance coupling RLC circuit.
本文对含有介观电容的介观电路作了理论推导和数值分析,主要研究了介观LC电路的量子压缩效应和介观电容耦合RLC电路的库仑阻塞效应。
6)  Coulomb charging effect
库仑荷电效应
1.
We observed Coulomb charging effect and the discrete energy level structure of Ge quantum dots with the typical diameter 13nm.
将导纳谱应用于半导体GeSi量子点的研究,观察到了典型直径为13nm的Ge量子点的库仑荷电效应及其分立能级结构。
补充资料:β氧化铝单晶生长台阶


β氧化铝单晶生长台阶


蘸义簇袋鬓戮雄髯绪价韧 日氧化铝单晶生长台阶〔背散射电 子象)
说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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