2) one-million-level dust-free
10万级空气净化
3) local clean zone with cleanliness
局部百级洁净区
1.
Discussion the practices and their advantages ane disadvantages of pharmaceutical clean rooms of local clean zone with cleanliness
浅谈制药厂洁净厂房局部百级洁净区的做法及其优缺点
4) lustration class
洁净等级
1.
Design and complication of coal resource lustration class evaluation system;
煤炭资源洁净等级评价系统设计及应用
5) cleaning area
洁净区
1.
Based on the experience of GMP reform and administration,with the stand point of the users,in this article,the current situations of cleaning engineering construction and operation administration in some small and middle scale enterprises were summarized and analyzed with respects to workshop construction and the operation of cleaning area.
根据GMP改造和运行管理的实践,从使用者的角度,以厂房建设和洁净区的运行实际为基础,总结、分析了目前一些中小企业药品制剂生产的洁净工程建设和运行管理的现状,找出其设计和运行中存在的差距和不足,提出了适合制剂中小药品制剂企业建造和运行的建议。
6) denuded zone
洁净区
1.
The influence of nitrogen and carbon on the width of denuded zone has been investigatedin this paper.
氮与碳的存在,降低了产生氧沉淀的初始间隙氧浓度的阈值,使洁净区宽度缩小。
2.
The effect of rapid thermal annealing (RTA) ambient on denuded zone and oxygen precipitates in Czochralski (CZ) silicon wafers is studied in this paper.
研究了N2和N2/NH3混合气两种不同气氛快速退火处理硅片对洁净区和氧沉淀分布的影响。
3.
The effect of nickel contamination under rapid thermal processing (RTP) on the magic denuded zone (MDZ) in Czochralski silicon is investigated.
研究了过渡族金属镍在快速热处理作用下对直拉单晶硅中洁净区形成的影响。
补充资料：[3-(aminosulfonyl)-4-chloro-N-(2.3-dihydro-2-methyl-1H-indol-1-yl)benzamide]
分子式：C16H16ClN3O3S
分子量：365.5
CAS号：26807-65-8
性质：暂无
制备方法：暂无
用途：用于轻、中度原发性高血压。
分子量：365.5
CAS号：26807-65-8
性质：暂无
制备方法：暂无
用途：用于轻、中度原发性高血压。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条