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1)  CO_2 laser direct-writing
CO_2激光直写
2)  laser direct writing
激光直写
1.
Optimization of S-curve intensity control model for laser direct writing;
激光直写中S曲线光强控制模型的参数优化(英文)
2.
Realization of electric control of laser direct writing mesh on concave spherical substrate;
激光直写凹球面网栅的电控实现
3.
Two beam interference laser direct writing technique for disk security;
干涉型激光直写技术用于光盘防伪
3)  laser writing
激光直写
1.
Focused spot shaping in laser writing system;
激光直写系统焦斑整形的研究
4)  LDWS
激光直写入
1.
AUTO FOCUSING IN LDWS BY USING COLLIMATING EYELET METHOD;
准直小孔法自动调焦在激光直写入系统中的应用
5)  laser direct writing photolithography
激光直写光刻
1.
The effect that the intensity of the writing spot relating to the amounts of defocus in the laser direct writing photolithography is analyzed based on the diffractive theory and the ray-tracing method, respectively.
采用理论计算和光线追迹分析了激光直写光刻中离焦对写入焦斑光场分布的影响;使用四轴激光直写设备开展了离焦激光直写光刻工艺实验,实验和理论计算及光线追迹的结果吻合得很好。
6)  laser direct writing(LDW)
激光直写光刻(LDW)
补充资料:[3-(aminosulfonyl)-4-chloro-N-(2.3-dihydro-2-methyl-1H-indol-1-yl)benzamide]
分子式:C16H16ClN3O3S
分子量:365.5
CAS号:26807-65-8

性质:暂无

制备方法:暂无

用途:用于轻、中度原发性高血压。

说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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