1) coating screen by spinning
旋涂法涂屏
2) coating screen by dry process
干法涂屏
3) spin-coating method
旋涂法
1.
Bilayered and monolayered TiO2-KTaO3 films have been fabricated by sol-gel spin-coating method and heated at deferent temperature for an hour.
通过溶胶凝胶法和旋涂法制备了单层和双层TiO2-KTaO3薄膜,并在不同的温度下退火1h,研究了该薄膜的湿敏传感特性。
4) spin coating
旋涂法
1.
A new cyanine film has been developed by means of spin coating for digital versatile disc recordable, The absorption spectrum and the complex refractive index of the cyanine thin film were measured, The absorption and reflection properties of the sublimated cyanine film are pretty good at 630～650 nm.
利用旋涂法 (spin coating)制备了一种新的菁染料薄膜 ,并进一步制备成可录型数字多用光盘 (DVD R) ,测试该菁染料溶液和薄膜的吸收光谱 ,薄膜的透过、反射光谱 ,用椭圆偏振光谱仪测试了薄膜光学常数n和k ,发现薄膜在 6 30～ 6 5 0nm波段内有良好的吸收和反射特性。
2.
In this paper,different precursor solution has been made to preparation Ca3Co4O9 thin film by spin coating technology and ultrasonic spraying.
本次实验制备了不同的前驱液,分别利用旋涂法及超声雾化法成功地在SiO2/Si衬底上生长出了Ca3Co4O9热电薄膜。
3.
A gas mixture of methane,hydrogen and nitrogen is used as the reaction gas,with nickel particles prepared by spin coating nickel nitrate solution on silicon,heat treatment and deoxidization with H2 as catalyzer.
采用热丝和射频等离子体复合化学气相沉积设备(PE-HF-CVD),以CH4、H2和N2为反应气体,在较低衬底温度下(500℃),用简单的催化剂制备方法——旋涂法在硅片上涂覆Ni(NO3)2溶液,经热处理及H2还原后的Ni颗粒为催化剂,在硅衬底上制备出了垂直于硅片且定向生长的碳纳米管薄膜。
5) spin-coating
旋涂法
1.
Some new self-assembly (SA) methods, including chemiadsorption, molecule deposition(electrostatic self-assembly),spin-coating etc.
介绍了自组装法制备聚合物纳米复合膜的几种最新技术 :化学吸附法、分子沉积法、旋涂法 。
2.
The homogeneous defectless and(100)oriented Pb_(1-x)Ca_xTiO_3 thin film with perovskite structure was grown on MgO single crystal substrate by spin-coating method.
用旋涂法在（１００）ＭｇＯ单晶衬底材料上生长出均匀、无缺陷的钙铁矿结构（１００）择优取向的Ｐｂ（Ｃａ）ＴｉＯ＿３薄膜，取向率大于９５％。
3.
The dependence of distribution of catalyst particles on spin-coating speed,PEG content and catalyst concentration was investigated.
采用聚乙二醇和铁盐、钴盐的乙醇溶液,通过旋涂法在硅基底表面分散得到制备单壁碳纳米管的催化剂颗粒,并用水汽辅助化学气相沉积法制备了直立生长的单壁碳纳米管。
6) spin-casting method
旋涂法
1.
The emitting layer, which consists ofPVK, Eu(DBM)3 and PBD is f0rmed by spin-casting method.
分别以稀土配合物为发光中心，以PPV、Alq3为空穴输送层和电子输送层制备了结构为ITO／PPV／PVK：PBD：Eu（DBM）3／Alq3／Al的电致发光器件，其中发射层由旋涂法形成，该器件的最大亮度为52cd·m－2，且具有很好的单色性。
补充资料：旋涂
分子式：
CAS号：
性质：电子工业中，基片垂直于自身表面的轴旋转，同时把液态涂覆材料涂覆在基片上的工艺。
CAS号：
性质：电子工业中，基片垂直于自身表面的轴旋转，同时把液态涂覆材料涂覆在基片上的工艺。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条