Laser-induced damage threshold of hafnia thin films with chemical method;

Precise measurement of the laser-induced damage threshold can be used to effectively evaluate the laser damage resistance of optical thin films.

X-ray diffraction(XRD),Lambda 900 spectrophotometer and 355 nm Nd∶YAG laser system were employed to measure crystal structure,transmittance spectra and laser-induced damage threshold(LIDT) of the samples.

And the laser damage threshold is also measured.

The doping ion of La~(3+) can improve the laser damage threshold and the stability of crystal-growth process of Yb:GdVO_4 crystal,weaken the fluorescence quenching and the fluorescence trapping effects of high Yb~(3+)-doped crystals.

The reason affecting laser damage threshold was analyzed.

Influence of the deposition method on the laser induced damage threshold of HfO_2 thin films;

Discussion of the measurement methods for laser induced damage threshold of optical coating;

The experimental results show that HfO2 thin films can achieve high refractive index,good surface micro morphology and excellent laser induced damage threshold.

The laser-induced damage threshold(LIDT) of the two kinds of films was measured.

Laser-induced damage thresholds(LIDT)were measured by “1 on 1” mode,and fore-and-aft changes of the surface morphology and fractal structure of the coating caused by laser conditioning were investigated with atomic force microscope(AFM)and multi-fractal spectrum(MFS),respectively.

In this paper, the effect of impurities in the vacuum chamber during the deposition of optical coatings on laser induced damage threshold (LIDT) of films is analysed.

Present status of study on dielectric coating highly reflective is introduced with emphasis laid on the focal points and some important achievements in the field of design principle,manufacturing methods,performance measurement and laser induced damage threshold.

The laser induced damage threshold of optical films has the high meaning to the laser technology.