1) single injection
单注入
2) single wafer implantation
单晶片注入
1.
Along with the development of integrated circuit,the traditional batch implantation has already can t satisfy a current process,the single wafer implantation with the mechanical scanning solved the technique problem,also controlling the cost risk,having a series of advantage of higher accuracy,less contamination etc,becoming the current high level ion implanter the best choice.
随着集成电路工艺技术的提高,对离子注入提出更高的要求,传统的批注入已不能满足当前的工艺,从而开发出了适应当前工艺的单晶片注入的机械扫描技术。
3) Single bunch injection
单束团注入
5) individual-well injection rate
单井注入量
6) single zone injection well
单层注入井
补充资料：单注
1.犹注定。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条