1) absorption base
吸收基
2) membrane-base absorption
膜基吸收
1.
H2S was removed from natural gas by membrane-base absorption technology on the experiment platform with MDEA solution being selected as the absorption and hydrophobic polyacrylic hollow fiber membrane(HFPPM) being selected as a contactor.
在膜接触器天然气脱硫实验平台上以N-甲基二乙醇胺(MDEA)水溶液为吸收剂,采用疏水性聚丙烯中空纤维膜(HFPPM)作为膜接触器,利用膜基吸收技术对天然气中的H2S进行脱除实验研究。
3) absorbed by the substrate
基底吸收
1.
Focus on two simple cases of “dry laser cleaning”,laser is strongly absorbed by the substrate only and by the contamination only,to discuss the physical mechanism of dry laser cleaning.
针对干式清洗中只被基底吸收和只被污染物吸收两种简单情况讨论了激光干式清洗的物理机理,并且给出了激光干式清洗典型的实验装置图。
5) Host absorption
基质吸收
6) fundamental absorption
基本吸收
补充资料：2-甲氧基碳酸基乙基胺基乙基胺基丙基三甲氧基硅烷
CAS: 1067-66-9
分子式: C12H28N2O5Si
分子量: 308.45
中文名称: 2-甲氧基碳酸基乙基胺基乙基胺基丙基三甲氧基硅烷
英文名称: [N'-(2-Methoxycarbonylethyl)aminoethylaminopropyl]trimethoxysilane
10-diaza-3-silatridecan-13-oic acid, 3,3-dimethoxy-2-oxa- methyl ester
n-(2-((3-(trimethoxysilyl)propyl)amino)ethyl)-beta-alanin methyl ester
methyl 3,3-dimethoxy-2-oxa-7,10-diaza-3-silatridecan-13-oate
methyl[2-(3-trimethoxysilylpropylamino)-ethylamino
分子式: C12H28N2O5Si
分子量: 308.45
中文名称: 2-甲氧基碳酸基乙基胺基乙基胺基丙基三甲氧基硅烷
英文名称: [N'-(2-Methoxycarbonylethyl)aminoethylaminopropyl]trimethoxysilane
10-diaza-3-silatridecan-13-oic acid, 3,3-dimethoxy-2-oxa- methyl ester
n-(2-((3-(trimethoxysilyl)propyl)amino)ethyl)-beta-alanin methyl ester
methyl 3,3-dimethoxy-2-oxa-7,10-diaza-3-silatridecan-13-oate
methyl[2-(3-trimethoxysilylpropylamino)-ethylamino
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条