1) off-axis illumination
旁轴照明
2) off-axis illumination
离轴照明
1.
Vectorial Hopkins formulation depending on angles of off-axis illumination;
离轴照明下依赖于入射角度的矢量霍普金斯公式
2.
Process window improvement is presented due to off-axis illumination(OAI) and phase-shifting mask(PSM) for 193 nm immersion lithography at 65 nm node.
研究了交替型相移掩模及离轴照明对65nm分辨率ArF浸没式光刻的影响。
3.
By using software for lithography simulation,the simulation results of lines with different width and pitch before and after adding SRAF are compared with that without off-axis illumination and sub-resolution assistance feature.
讨论了亚波长光刻条件下的离轴照明和次分辨率辅助图形两种分辨率的增强技术,分析了两种技术的原理,利用光刻模拟软件,针对不同线宽的稀疏线条,对添加次分辨率辅助图形前后的光刻仿真结果进行了对比。
3) axial illumination
轴上照明
4) axial illumination method
轴上照明法
5) off-aixs illumination
离轴照明技术
6) oblique off-axis illumination
离轴倾斜照明
补充资料:旁旁
1.强壮有力貌。
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