1) corrosion resisant
抗蚀的
2) Simax(商)
西马克斯玻璃<一种耐热抗蚀的硼硅酸盐玻璃>
3) corrosion resistance
抗蚀
4) corrosion resistance
抗蚀性
1.
The sinterability and corrosion resistance of zircon-based ramming mix for glass kiln bottoms with the addition of fused corundum zirconia micropowder (mp-FAZS) prepared using a high-energy planetary ball mill were investigated.
采用行星磨微细化的熔铸锆刚玉微粉(fused corundum zirconia micropowder,mp-FAZS)改善玻璃窑池底用锆英石捣打料的烧结性和抗蚀性。
2.
Meanwhile,atmospheric exposure test and electrolyte soaking method were applied to investigate the effect of different rare earth catalyzers and their content on corrosion resistance of sulfurized Cr12 steel.
借助稀土的催渗作用实现了Cr12钢表面的低温熔融渗硫,用扫描电镜(SEM)和俄歇电子能谱仪(AES)分析了渗硫层的微观形貌和基本成分,并通过大气暴露试验和电解质浸泡试验考察了渗剂中稀土添加剂的类别和加入量对渗硫层抗蚀性的影响规律。
3.
Corrosion resistance and adhesive force to coating of works could increase strongly by seal treatment to bluing works in silane coupling agent.
用该封闭剂对发蓝工件进行封闭处理后,能明显提高工件的抗蚀性和对涂层的附着力,解决了因皂化和铬酸盐钝化而带来的涂层附着力较差和环境污染等问题。
5) anticorrosive mechanism
抗蚀机理
1.
The anticorrosive mechanisms and excellent performances of the zinc-based waterborne compound coatings(Dacromet process) are introduced.
介绍了锌基水系复合涂层——达克罗表面处理技术的抗蚀机理和优异性能。
6) resist
抗蚀剂
1.
Minimize the diffraction influence by resist process optimization in X-ray lithography;
优化抗蚀剂的预烘工艺减小衍射对X射线光刻的影响
2.
This article presents the development,main resist system and reaction mechanism of EB resist in last ten years In addition,the future directio n of EB resist is illuminate
本文综述了近 10年来电子束化学增幅抗蚀剂的概况、主要组成、成像反应机理及电子束抗蚀剂的发展方向。
3.
The exposure manner,the needed vacuum degree,the selection of resist,the needed energy and dosage for this technique are investigated theoretically and experimentally,and a conclusion is got that the electron beam energy and dosage are sufficient enough for curing liquid resist,such as Epoxy618,in electron beam lithography system with a vacuum degree higher than 1.
对该工艺的曝光方式、真空度需求、抗蚀剂选择以及能量和剂量需求等问题进行了理论分析和实验研究。
参考词条
补充资料：X射线抗蚀剂
分子式：
CAS号：
性质：采用软X射线（波长0.4～5nm）作为曝光源的抗蚀剂。由于X射线波长较紫外波长短两个数量级，几乎没有衍射的干扰，而且因其能量比电子束小得多，可以获得高分辨率，X射线对尘埃的透过性好，曝光工艺的缺陷率就低。所有的电子束抗蚀剂均可作X射线抗蚀剂。
CAS号：
性质：采用软X射线（波长0.4～5nm）作为曝光源的抗蚀剂。由于X射线波长较紫外波长短两个数量级，几乎没有衍射的干扰，而且因其能量比电子束小得多，可以获得高分辨率，X射线对尘埃的透过性好，曝光工艺的缺陷率就低。所有的电子束抗蚀剂均可作X射线抗蚀剂。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。