1) uniform stitches
均匀线迹
2) stitch density uneven
线迹密度不均匀
3) stitch tension uneven
线迹张力不均匀
4) trace uniformity
轨迹均匀性
1.
The research method of the trace uniformity of plane lapping/polishing is described, and the mathematical function and the uniformity of trace for lapping/polishing modes mentioned above are discussed, and the deficiency of the current trace study is analyzed.
介绍了平面研磨抛光轨迹均匀性的研究方法,详细阐述了双轴式(包括定偏心式和不定偏心式)、直线式、摇摆式、计算机控制小工具式单面研磨抛光轨迹和行星式双面研磨抛光轨迹的数学函数及其轨迹均匀性,指出了当前轨迹研究中存在的不足。
5) uniform linear array
均匀线阵
1.
Improved active array calibration algorithm for mutual coupling and amplitude-phase error of uniform linear array
均匀线阵互耦和幅相误差有源校正改进算法
2.
Based on the theory of array signal processing, a method is proposed to estimate bearings of multiple coherent mechanical noise sources with the singular value decomposition(SVD) of a data matrix and orthogonality of spectrum using a uniform linear array.
提出利用均匀线阵接收的数据构造一种矩阵进行奇异值（ＳＶＤ）分解，以实现对相干噪声源的方位估计。
3.
A separable approach based on the SVD of a data matrix is proposed to estimate frequencies and bearings of noise sources by a uniform linear array.
本文提出利用均匀线阵接收的数据构造一种矩阵进行奇异值分解，以对频率、方位两参数进行分离估计，用频率谱估计出声源频率，用方位谱估计出声源方位角。
6) homogeneous line width
均匀线宽
1.
n this paper,the authors report the temperature dependence of homogeneous line width in photon-gated spectral hole burning materials:metal-tetrabenzoporphyrin derivatives/p-hyfroxybenzaldhyde/PMMA or CA,at a temperature range,from 30K to 70K.
本文通过在不同温度下对金属卟琳系列光子选通光谱烧孔材料的测试，研究了部分有机电子转移型烧孔材料的均匀线宽随温度变化的关系，在３０Ｋ到７０Ｋ温度范围内得到了Γｈｏｍ∝Ｔ１。
补充资料：迹线
见流线。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条