1) dry cleaning process,dry-scrubbing process
干洗法<冶>
2) slag washing process
洗渣法<冶>
3) dry method washing coal
干法洗煤
4) Quick hand disinfection
干洗手法
5) dry cleaning
干法清洗
1.
The plasma process is an important part of the dry cleaning s application.
等离子体工艺是干法清洗应用中的重要部分,随着微电子技术的发展,等离子体清洗的优势越来越明显。
2.
The productivity of dry cleaning is improved as well.
随着微电子工艺的发展,湿法清洗越来越局限,而干法清洗能够避免湿法清洗带来的环境污染,同时生产率也大大提高。
3.
The primary introduction of the type and the impact of contamination in semi-conductor IC processing are given, and described the method of contamination removal, analyzedthe feature of wet cleaning and dry cleaning, and the effect of contamination removal.
介绍了半导体IC制程中存在的各种污染物类型及其对IC制程的影响和各种污染物的去除方法,并对湿法和干法清洗的特点及去除效果进行了分析比较。
6) dry cyaniding
干法氰化<冶>
补充资料：融融冶冶
1.美好艳冶。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条