1) molybdous iodide
二碘化钼
2) molybdenum iodide
碘化钼<冶>
3) diphenyl iodonium iodide
碘化二苯碘
4) molybdenum disilicide
二硅化钼
1.
Two important routes currently being used to improve molybdenum disilicide mechanical property and oxidation are the alloying approach and the doping approach.
介绍了二硅化钼合金化及掺杂改性的研究进展,对几种重要合金化元素和掺杂元素改性的二硅化钼材料进行了评述,并在此基础上提出了高性能二硅化钼材料研究开发的重点和方向。
2.
Applications of 2 different extrusion modes(equal channel angular extrusion and conventional forward extrusion) to the forming of molybdenum disilicide electric heating elements and their influence on the micro structure and density are studied.
本文研究将2种不同挤压方式(等径角挤压和传统正挤压)应用于二硅化钼电热元件的成型工艺,研究其对材料的微观组织及致密度的影响。
5) MoS_2
二硫化钼
1.
Study of the Tribological Behavior of Kaolinite Based Geopolymer Composites Filled with MoS_2;
二硫化钼填充高岭土基矿物聚合物复合材料的摩擦学性能研究
2.
Study on the Friction and Wear Properties of Polyimide Composites Filled with Polytetrafluoroethylene and MoS_2;
聚四氟乙烯和二硫化钼填充聚酰亚胺复合材料的摩擦磨损性能研究
3.
TRIBOLOGICAL PROPERTIES OF HYBRID CARBON FIBER AND MoS_2 REINFORCED POLYAMIDE 1010 COMPOSITES;
碳纤维和二硫化钼混杂增强尼龙复合材料的摩擦学性能研究
6) MoSi2
二硅化钼
1.
Self-propagating high temperature synthesis (SHS)is regarded as an effective technique for producing MoSi2 and MoSi2 based composites due to its low cost, quick reaction speed and high transformation rate.
自蔓延高温合成技术因具有低成本、反应速度快和转化率高等许多优点,成为制备二硅化钼基材料的有效方法。
2.
Various processes of the Mo/Si thin films deposited on Si (001) substrates by RF magnetron sputtering technique were carefully investigated and the MoSi2 thin film with the single tetragonal phase and low resistivity was successfully prepared.
用射频磁控溅射法在硅基底上成功制备出具有低电阻率的单一四方相二硅化钼薄膜,并通过X射线衍射仪、原子力显微镜及四探针电阻测试仪对退火前后的薄膜样品进行了结构和电学性能分析。
3.
The recent investigation development of MoSi2 including crystal structure,microstructure,properties and main application fields was reviewed.
金属间化合物二硅化钼由于具有较小的密度、较高的熔点,优异的抗氧化性,尤其是具有可贵的随温度上升强度并不下降的特性(R特性),使其得到广泛应用。
补充资料：融融冶冶
1.美好艳冶。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
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