1) plasma loading characteristics
等离子体负载特性(曲线)
3) plasma load
等离子体负载
1.
According to the voltage and the wave of current in the thin film deposition and the computer simulation,this paper introduces the structure of power and the key technology,approaches the match of power and plasma load in arc ion plating and raises the design requirements of pulsed negative bias power in arc ion plating.
介绍了电源的结构和关键技术 ,并结合薄膜沉积试验中的电压、电流波形和计算机仿真分析 ,探讨了电源和电弧离子镀的等离子体负载间的匹配 ,提出了电弧离子镀脉冲负偏压电源的设计要
2.
This paper investigated on several problems of PBAIP, including its plasma load characteristic, pulsed bias power supply, the matching between pulsed bias power supply and plasma load of arc ion plating (AIP), and the "green" design of pulsed bias power supply.
本论文就其中电弧离子镀的等离子体负载特性、脉冲偏压电源及脉冲偏压电源与电弧离子镀等离子体负载间的匹配、脉冲偏压电源的绿色化设计等问题进行了深入研究。
4) V curve
V形曲线，负载特性曲线
5) Electronegative plasma
电负性等离子体
6) load characteristic curve
负荷特性曲线，负载特性曲线
补充资料：OC曲线(见抽样特性曲线)
OC曲线(见抽样特性曲线)
operating characteristic curve: see operating characteristic curve of sampling
O(:quxlanOC曲线(叮旧瓜叮唱Cha比‘teristic~抽样特性曲线。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条