1) MoS2/polyimide coating
MoS2/PI薄膜
2) MoS 2 thin films
MoS2薄膜
3) PI film
PI薄膜
1.
The microstructure of the film, distribution, shape and size of inorganic nanoparticle in hybrid PI film prepared by sol-gel method and Dupont 100 CR film have been studied by means of XRD, SAXS, SEM, TEM and materials structure and property simulation soft.
采用Materials Studio软件模拟PI和纳米杂化PI薄膜电子结构、几何结构及能量状态。
5) MoS2-Zr composite coatings
MoS2-Zr复合薄膜
1.
The pure MoS2 coatings and MoS2-Zr composite coatings were prepared on the surface of cemented carbides YT14 with complex deposited process of medium-frequency magnetron sputtering and multi-arc ion plating.
采用中频磁控溅射技术及多弧离子镀相结合的复合镀膜工艺,在硬质合金YT14基体上制备了MoS2-Zr复合薄膜。
6) MoS2 /Zr composite coating
MoS2/Zr复合薄膜
1.
The complex deposited process which fitted medium-frequency magnetron sputtering together with multi-arc ion plating,was utilized to prepare the MoS2 /Zr composite coating on the surface of cemented carbides YT14.
采用新型中频磁控溅射技术及多弧离子镀相结合的复合镀膜工艺,在硬质合金YT14基体上制备了MoS2/Zr复合薄膜。
补充资料：E/D MOS电路
见增强型与耗尽型金属-氧化物-半导体集成电路。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
参考词条