In order to clarify the scale-dependent interface diffusion behavior,the resistivity (ρ) and the specular reflection coefficient (P) of Ni/Al nanomultilayers deposited by magnetron sputtering as a function of the periodic number (n),Ni/Al modulated ratio (R) and modulated period (L) have been characterized by Fuchs-Sondheimer (FS)-Mayadas-Shatzkes (MS) model.

Study on metallic mask method for preparing nano-multilayers;

Influence of Cu interlayer thickness on ferromagnetic coupling of Co/Cu/Co nano-multilayers;

Micro-motion wear resistance of electro-brush plated Cu/Ni nano-multilayer film;

High magnetic loss nano-multilayer film for control of EMI;

Research in preparation of free-standing Cu/Zr nano-multilayer film;

Influence of the growth of c-AIN on the mechanical properties of AlN/(Ti,Al)N nanomultilayers;

Characterization of Hall-Petch relation on microstructural parameter of softer sublayer and the hardness in nanomultilayers;

First-principles Inverstigation on the Interfaces for Nanomultilayers Ti/TiN, TiN/CrN, and TiN(NbN)/SiNx;