The deposition of diamond-like carbon films produced by radio frequency glow discharge of hydrocarbon gas was studied,and the effects of radio frequency voltage and deposition time on the thickness and the Vickers microhardness of films were investigated.

Plasma chemical vapor deposition in silane radio frequency glow discharge is a main fabrication technology of hydrogenated amorphous silicon(a-Si:H)films.

This paper reports that a heated and tuned Langmuir probe has been used on the measurement of the electron energy distribution function f(E), the mean electron energy and the electron concentration in radio frequency glow discharge plasma, and gives a systemic analysis about the effect of the technology parameters on the electron character in plasma space.

Optical emissiom spectra of SiH 4 rf glow discharge were measured by OMA-4000.

c-Si∶H/a-Si∶H multilayers have been prepared with RF glow-discharge method in which two types of coupling electrodes are alternately changed periodically.

Microhollow cathode discharge,so-called MHCD,is a kind of high-pressure glow discharges where the opening in cathode is in order of 100μ-m.

High-pressure glow discharge has many applications such as surface modification, thin film deposition, detoxification of gaseous pollution, plasma display panel, UV excimer lamps and UV excimer laser.

Hydrogen generation from reforming of lower alcohols aqueous solution by glow discharge plasma under liquid;

An overview on atmospheric pressure glow discharge for textile treatment;

Influence of hot cathode glow discharge on the deposition of diamond films;