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1)  IMEC cleaning
IMEC清洗法
2)  ablution [英][əb'lu:ʃən]  [美][əb'luʃən]
洗净,清洗法
3)  Cleaning method
清洗方法
1.
A study on the PVC membrane fouling in MBR and its cleaning method;
膜-生物反应器中PVC膜污染及清洗方法研究
2.
Cleaning method and mechanism of a submerged membrane bioreactor for a long-term operation
膜生物反应器长期运行条件下膜的清洗方法及机理研究
3.
The problem in runningof high-speed paper machine will be reduced, the product quality and the system’s performance will be improved by analyzing the dirt indifferent sections of the system and then by finding out the cleaning method.
对现代高速纸机生产系统各部污垢物进行组分分析,制定针对性的清洗方法,可以有效减少纸机在连续运行中产生的问题和提高纸张质量,改善系统运行性能。
4)  wet cleaning
湿法清洗
5)  dry cleaning
干法清洗
1.
The plasma process is an important part of the dry cleaning s application.
等离子体工艺是干法清洗应用中的重要部分,随着微电子技术的发展,等离子体清洗的优势越来越明显。
2.
The productivity of dry cleaning is improved as well.
随着微电子工艺的发展,湿法清洗越来越局限,而干法清洗能够避免湿法清洗带来的环境污染,同时生产率也大大提高。
3.
The primary introduction of the type and the impact of contamination in semi-conductor IC processing are given, and described the method of contamination removal, analyzedthe feature of wet cleaning and dry cleaning, and the effect of contamination removal.
介绍了半导体IC制程中存在的各种污染物类型及其对IC制程的影响和各种污染物的去除方法,并对湿法和干法清洗的特点及去除效果进行了分析比较。
6)  wet clean
湿法清洗
1.
Some certain researches and theoretical analysis on it were carried out,and wet clean method was proposed for removing the pad crystal defect.
国际上已经对这一缺陷的形成有了一定的理论分析,也提出了可以通过湿法清洗来去除此缺陷。
2.
7% of the surface particles and polymer residue can be effectively removed through a novel wet cleaning process by 15 min HF and 10 min sulfuric-peroxide mixture(SPM)with 300 W megasonic.
在硅化钨刻蚀前利用电子束扫描发现,15min的氢氟酸和10min浓硫酸与过氧化氢混合溶液(SPM)在300W超声波条件下的新湿法清洗工艺,能去除84。
补充资料:不停车物理清洗法
分子式:
CAS号:

性质:又称不停车物理清洗法。在系统处于运行条件下,使用清洗机械进行设备的清洗作业。

说明:补充资料仅用于学习参考,请勿用于其它任何用途。
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