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1)  vertical pulsed laser deposition (VPLD)
垂直脉冲激光沉积法
2)  vertical pulsed-laser deposition (VPLD)
垂直靶向脉冲激光沉积
3)  vertical pulsed laser deposition
垂直脉冲激光沉积
4)  vertical target pulsed laser deposition(VTPLD)
垂直靶向脉冲激光沉积(VTPLD)
5)  pulsed laser deposition
脉冲激光沉积法
1.
Recent advances on ZnO-based films synthesized by pulsed laser deposition;
脉冲激光沉积法制备ZnO基薄膜研究进展
2.
The even single phase βFeSi_2 thin films were prepared by femtosecond pulsed laser deposition(PLD) on Si(111) wafers at different temperature using an FeSi_2 alloy target,and excimer(nanosecond) PLD was introduced to prepared β-FeSi_2 thin films also.
用FeSi2合金靶作为靶材,采用准分子激光沉积法在Si(111)单晶基片上制备了单相的-βFeSi2薄膜,并将飞秒脉冲激光沉积法(PLD)引入到-βFeSi2薄膜的制备工艺中;用X射线衍射仪(XRD),场扫描电镜(FSEM),能谱仪(EDS),紫外可见光光谱仪研究了薄膜的结构、组分、表面形貌和光学性能。
3.
5CoO3(LSCO) oxide thin films were realized on SrTiO3(001) substrates by pulsed laser deposition.
利用脉冲激光沉积法在STO(001)基片上外延生长了La0。
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6)  pulsed laser deposition method
脉冲激光气相沉积法
1.
02) dilute magnetic semiconductor thin films deposited on Si (001) substrates at 650℃ by pulsed laser deposition method were studied by X-ray absorption fine structure,X-ray diffraction and magnetic measurement.
利用X射线吸收精细结构、X射线衍射和磁性测量等技术研究脉冲激光气相沉积法制备的Zn1-xCoxO(x=0。
补充资料：垂直布里奇曼法(见布里奇曼法生长单晶)


垂直布里奇曼法(见布里奇曼法生长单晶)
vertical Bridgman method

垂直布里奇曼法vertieal Brid脚an method见布里奇曼法生长单晶。
说明：补充资料仅用于学习参考，请勿用于其它任何用途。
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