1)  Electroless Plating Copper
沉铜
2)  deposition rate
沉铜速度
1.
The factors affecting the deposition rate of copper and stability of electroless copper plating solution were investigated.
结果表明,优选出的的镀液稳定性相对较高、沉铜速度快、镀层外观较好。
2.
The results indicate that the copper deposition rate decreases with the increase of the concentration of potassium sodium tartrate and EDTA·2Na and plating time, and increases with the increase of the concentration of CuSO4·5H2O and HCHO, pH value and reaction temperature.
研究了酒石酸钾钠(TART)和EDTA·2Na盐双络合化学镀铜体系中各因素对沉铜速度稳定性及镀层附着力的影响。
3)  deposition rate
沉铜速率
1.
The absorption spectrum and copper deposition rate of a given chemical copper plating solution affected by different surfactants and polar organics were investigated.
研究了固定的化学镀铜基础配方在表面活性剂与极性有机物作用下的吸收光谱和沉铜速率;探讨了表面活性剂和极性有机物、光谱曲线变化、沉铜速率3者之间的内在联系及相互作用机理。
补充资料:醋酸铜合亚砷酸铜
分子式:Cu(CH3COO)2·3Cu(ASO2)2
CAS号:

性质:学名醋酸铜合亚砷酸铜(Copper acetoarsenit)。醋酸铜和亚砷酸铜的复盐。深绿色粉末。能溶于酸。不溶于水和醇。能水解。空气中二氧化碳作用生成亚砷酸。可由亚砷酸钠、醋酸和硫酸铜作用而制得。农药上用作杀虫剂,常与消石灰混合。并配成90%可湿性粉剂使用,以降低其药害。也可用于木材防腐。

说明:补充资料仅用于学习参考,请勿用于其它任何用途。